ዊ Supporting Information Study of the Structure-Properties Relationship of Phenolic Molecular Glass Resists for Next Generation Photolithography Anuja De Silva, a Jin Kyun Lee, b Xavier André, b Nelson M. Felix, c Heidi B. Cao, d Hai Deng d and Christopher K. Ober b * a Department of Chemistry and Chemical Biology, Cornell University, Ithaca NY 14850, USA. b Department of Materials Science and Engineering, Cornell University, Ithaca NY 14850, USA. c Department of Chemical and Biomolecular Engineering, Cornell University, Ithaca NY 14850, USA. d Intel Corp., 5200 N.E. Elam Young Parkway, Hillsborough, OR 97124, USA. *Corresponding Author: cober@ccmr.cornell.edu Contents Synthesis and characterization of t-BOC protected CR1-CR10 p 2-9 Characterization of the additional Molecular Glasses (CR7-CR10) p 10 DSC data for MG series 1 and 2 p 11-14 XRD data for MG series 1 and 2 p 15-18