Accepted Manuscript Structural and optical characterization of carbon nitride layers deposited by plasma assisted chemical vapor deposition at various conditions Katarzyna Tkacz-Śmiech, Katarzyna Koper, Andrzej Mikuła, Bouchta Sahraoui, Janusz Jaglarz PII: S0040-6090(17)30853-2 DOI: doi:10.1016/j.tsf.2017.11.016 Reference: TSF 36348 To appear in: Thin Solid Films Received date: 17 March 2017 Revised date: 12 October 2017 Accepted date: 11 November 2017 Please cite this article as: Katarzyna Tkacz-Śmiech, Katarzyna Koper, Andrzej Mikuła, Bouchta Sahraoui, Janusz Jaglarz , Structural and optical characterization of carbon nitride layers deposited by plasma assisted chemical vapor deposition at various conditions. The address for the corresponding author was captured as affiliation for all authors. Please check if appropriate. Tsf(2017), doi:10.1016/j.tsf.2017.11.016 This is a PDF file of an unedited manuscript that has been accepted for publication. As a service to our customers we are providing this early version of the manuscript. The manuscript will undergo copyediting, typesetting, and review of the resulting proof before it is published in its final form. Please note that during the production process errors may be discovered which could affect the content, and all legal disclaimers that apply to the journal pertain.