Available online at www.sciencedirect.com ScienceDirect Materials Today: Proceedings 7 (2019) 715–720 www.materialstoday.com/proceedings 2214-7853 © 2018 Elsevier Ltd. All rights reserved. Selection and peer-review under responsibility of the scientific committee of the Nanotech Malaysia 2018. Nanotech Malaysia 2018 Atmospheric pressure plasma needle jet treated on aluminium thin film for semiconductor industries Rizon Rizan Elfa a , Nafarizal Nayan b *, Mohd Khairul Ahmad a , Kusnanto Mukti Wibowo a , Chin Fhong Soon a , Mohd Zainizan Sahdan c , Mohamad Hafiz Mamat d , Mohd Yazid Ahmad e , Ali Aldalbahi f a Faculty of Electrical and Electronic Engineering, Universiti Tun Hussein Onn Malaysia (UTHM), 86400 Parit Raja, Batu Pahat, Johor Malaysia. b Microelectronics and Nanotechnology- Shamsuddin Research Centre (MiNT-SRC), Institute for Integrated Engineering, Universiti Tun Hussein Onn Malaysia (UTHM), 86400 Parit Raja, Batu Pahat, Johor, Malaysia. c Preston GeoCEM Sdn Bhd, No 33A, Jalan Universiti 4, Taman Universiti, 86400 Parit Raja, Johor, Malaysia d NANO-Electronic Centre, Faculty of Electrical Engineering, Universiti Teknologi MARA, Shah Alam, 40450 Selangor, Malaysia. e Nanorian Technologies Sdn Bhd, No. 40 & 40-1, Jalan Kajang Perdana 3/2, 43000 Kajang Selangor, Malaysia. f Chemistry Department, King Saud University, Riyadh 11451, Saudi Arabia. Abstract Atmospheric pressure plasma jet has been explored for pre-treatment applications especially in replacing the conventional vacuum plasma cleaning in semiconductor industries. The pre-treatment of plasma is needed to reduce or eliminate adventitious surface contamination on the thin film. This paper shows that the atmospheric pressure plasma jet treatment is highly effective in activating the surface of aluminium (Al) thin film. The image of Al thin film surface topography shows that the treated surface roughness was reduced however the grain size of the particles was unchanged. The XRD pattern of treated Al thin film also remained the same as before of the atmospheric pressure plasma jet treatment. This shows that the atmospheric pressure plasma jet introduce activation layer on the thin film surface without given impact to the thin film crystality. © 2018 Elsevier Ltd. All rights reserved. Selection and peer-review under responsibility of the scientific committee of the Nanotech Malaysia 2018. Keywords: Atmospheric pressure plasma jet; surface wettability; thin film cleaning; AFM; XRD * Corresponding author. Tel.: +607-4538-611; fax: +603-4536-060 E-mail address: nafa@uthm.edu.my