Influence of tip-surface interactions and surface defects on Si100surface structures by low-temperature 5Kscanning tunneling microscopy D. Riedel, M. Lastapis, M. G. Martin, and G. Dujardin Laboratoire de Photophysique Mole ´culaire, Ba ˆt. 210, Universite ´ Paris Sud, 91405 Orsay, France Received 10 November 2003; published 8 March 2004 The Si100surface structures on n-type degenerately doped samples ( 0.005 cm) have been investi- gated with a scanning tunneling microscope STMat very low temperature 5K. We have developed a method to monitor quantitatively the proportion of the various observed surface structures p (2 2), c (4 2) and flickering. This study has been performed as a function of the tunnel current and the presence or notof surface defects in the observed areas. The normal surface areas having a low density of defects 1% have been observed to vary from the p (2 2) to the c (4 2) structures when the tunnel current increases. This indicates that the STM tip-surface interaction strongly influences the observed structures. Furthermore, surface areas completely free of any defects are dominated by flickering structures. DOI: 10.1103/PhysRevB.69.121301 PACS numbers: 68.35.Bs, 68.37.Ef Over the past 20 years, the atomic structure of the Si100 reconstructed surface has been the subject of intense experi- mental and theoretical work. The first low-temperature scan- ning tunneling microscope STMexperiment at 120 K by Wolkow 1 nicely confirmed that the flip-flop motion of the Si dimers which occurs at room temperature is frozen at this temperature giving rise to a c (4 2) reconstruction. It was expected that the c (4 2) structure would remain the most stable structure down to very low temperature. However, quite surprisingly, recent STM experiments have shown that new reconstructions such as symmetric dimers 2–3 or static p (2 2) structures 4 can be observed at very low temperature 10 K. There have been several controversial discussions concerning the origin of these new reconstructions. 3–6 Very recently, Sagisaka et al. 6 suggested that the scattered elec- trons issued from the STM tip might be responsible for the observed transition from the c (4 2) to the p (2 2) reconstruction. 7 This structure manipulation has been evi- denced by plotting the evolution of the STM topographies as a function of the surface voltage and tunnel current. Never- theless, we have observed that such surface structure modi- fications occur when the imaging of the same area is repeated even though the surface voltage and tunnel current are kept constant. Under such conditions, it is difficult to demonstrate the influence of the STM tip interaction with the surface, only by showing various images recorded at different surface voltages and tunnel currents. In this paper, we propose a statistical approach to clarify this structure manipulation with the STM tip. The Si100n-type, As dopedsurface after cooling down to 5 K has been observed under a positive and negative surface voltage. For the positive surface voltage, we have counted the proportion of silicon dimers observed in a c (4 2), p (2 2) or flickering surface structure relative to the total number of dimers observed in the scanned area. By plotting this proportion of each of these structures structure probabilityas a function of the tunnel current, we find that the p (2 2) structure shows a strong tendency to be trans- formed into the c (4 2) structure when the STM tip surface interaction increases on normal surface areas defects 1%. Furthermore, we demonstrate that the flickering structure dominates the surface areas that are completely free of de- fects. The influence of these two effects; the STM-tip surface interaction and surface defects, makes the study of this sur- face reconstruction a very difficult task. The experiments have been performed with an ultrahigh vacuum UHVlow-temperature LTscanning tunneling microscope STM. 8 It is composed of a load-lock chamber, a preparation chamber, and a STM chamber. The STM UHV chamber is equipped with a four-liter liquid helium cryostat bath to which the whole STM is connected. This ‘‘beetle’’ type 9 STM is surrounded with a double radiation shield in- side the STM chamber. The external shield is cooled with a liquid nitrogen bath while the internal shield is cooled with the liquid helium bath. The shields are pierced on the sides with removable windows or shutters permitting different functionalities: observation, laser irradiation, or molecular deposition. A front shutter permits samples and tips to be transferred via a cooled manipulator from the preparation chamber. The temperature inside the STM is measured at two points with two silicon diodes DT-470, Lake shore. The temperatures indicated in this paper correspond to the tem- perature of the base plate of the STM situated near the sample holder. It indicates the temperature of the sample, after stabilization of the cooling process, with a precision of 0.25 K in the range 2–100 K. The preparation chamber can receive samples or tips from the load-lock chamber and is equipped with a thermal sensor on its manipulator and elec- trical connection to sample holders or tip holders. The samples used in this experiment are prepared in an ultrahigh vacuum chamber with a base pressure of 7 10 -11 Torr. They are Si100n-type As doped with a resistivity 0.004– 0.006 cm and a thickness e 100 m. The preparation of the silicon sample starts by resistively heating to 650 °C for a predegassing period of about 12 h. The sample holder is then cooled to 6 K with a liquid He cir- culation through the manipulator while the heating of the sample is kept fixed. We then proceed to rapidly flash the sample as explained in other works, 10 with a slow decline in temperature from 950 to 750 °C. The sample is then cooled back down to 6 K and transferred into the STM chamber at this temperature. This procedure allows us to obtain very RAPID COMMUNICATIONS PHYSICAL REVIEW B 69, 121301R2004 0163-1829/2004/6912/1213014/$22.50 ©2004 The American Physical Society 69 121301-1