Influence of tip-surface interactions and surface defects on Si„100… surface structures
by low-temperature „5K… scanning tunneling microscopy
D. Riedel, M. Lastapis, M. G. Martin, and G. Dujardin
Laboratoire de Photophysique Mole ´culaire, Ba ˆt. 210, Universite ´ Paris Sud, 91405 Orsay, France
Received 10 November 2003; published 8 March 2004
The Si100 surface structures on n-type degenerately doped samples ( 0.005 cm) have been investi-
gated with a scanning tunneling microscope STM at very low temperature 5K. We have developed a
method to monitor quantitatively the proportion of the various observed surface structures p (2 2), c (4
2) and flickering. This study has been performed as a function of the tunnel current and the presence or
not of surface defects in the observed areas. The normal surface areas having a low density of defects 1%
have been observed to vary from the p (2 2) to the c (4 2) structures when the tunnel current increases. This
indicates that the STM tip-surface interaction strongly influences the observed structures. Furthermore, surface
areas completely free of any defects are dominated by flickering structures.
DOI: 10.1103/PhysRevB.69.121301 PACS numbers: 68.35.Bs, 68.37.Ef
Over the past 20 years, the atomic structure of the Si100
reconstructed surface has been the subject of intense experi-
mental and theoretical work. The first low-temperature scan-
ning tunneling microscope STM experiment at 120 K by
Wolkow
1
nicely confirmed that the flip-flop motion of the Si
dimers which occurs at room temperature is frozen at this
temperature giving rise to a c (4 2) reconstruction. It was
expected that the c (4 2) structure would remain the most
stable structure down to very low temperature. However,
quite surprisingly, recent STM experiments have shown that
new reconstructions such as symmetric dimers
2–3
or static
p (2 2) structures
4
can be observed at very low temperature
10 K. There have been several controversial discussions
concerning the origin of these new reconstructions.
3–6
Very
recently, Sagisaka et al.
6
suggested that the scattered elec-
trons issued from the STM tip might be responsible for the
observed transition from the c (4 2) to the p (2 2)
reconstruction.
7
This structure manipulation has been evi-
denced by plotting the evolution of the STM topographies as
a function of the surface voltage and tunnel current. Never-
theless, we have observed that such surface structure modi-
fications occur when the imaging of the same area is repeated
even though the surface voltage and tunnel current are kept
constant. Under such conditions, it is difficult to demonstrate
the influence of the STM tip interaction with the surface,
only by showing various images recorded at different surface
voltages and tunnel currents. In this paper, we propose a
statistical approach to clarify this structure manipulation with
the STM tip. The Si100n-type, As doped surface after
cooling down to 5 K has been observed under a positive and
negative surface voltage. For the positive surface voltage, we
have counted the proportion of silicon dimers observed in a
c (4 2), p (2 2) or flickering surface structure relative to
the total number of dimers observed in the scanned area. By
plotting this proportion of each of these structures structure
probability as a function of the tunnel current, we find that
the p (2 2) structure shows a strong tendency to be trans-
formed into the c (4 2) structure when the STM tip surface
interaction increases on normal surface areas defects 1%.
Furthermore, we demonstrate that the flickering structure
dominates the surface areas that are completely free of de-
fects. The influence of these two effects; the STM-tip surface
interaction and surface defects, makes the study of this sur-
face reconstruction a very difficult task.
The experiments have been performed with an ultrahigh
vacuum UHV low-temperature LT scanning tunneling
microscope STM.
8
It is composed of a load-lock chamber,
a preparation chamber, and a STM chamber. The STM UHV
chamber is equipped with a four-liter liquid helium cryostat
bath to which the whole STM is connected. This ‘‘beetle’’
type
9
STM is surrounded with a double radiation shield in-
side the STM chamber. The external shield is cooled with a
liquid nitrogen bath while the internal shield is cooled with
the liquid helium bath. The shields are pierced on the sides
with removable windows or shutters permitting different
functionalities: observation, laser irradiation, or molecular
deposition. A front shutter permits samples and tips to be
transferred via a cooled manipulator from the preparation
chamber. The temperature inside the STM is measured at two
points with two silicon diodes DT-470, Lake shore. The
temperatures indicated in this paper correspond to the tem-
perature of the base plate of the STM situated near the
sample holder. It indicates the temperature of the sample,
after stabilization of the cooling process, with a precision of
0.25 K in the range 2–100 K. The preparation chamber can
receive samples or tips from the load-lock chamber and is
equipped with a thermal sensor on its manipulator and elec-
trical connection to sample holders or tip holders. The
samples used in this experiment are prepared in an ultrahigh
vacuum chamber with a base pressure of 7 10
-11
Torr.
They are Si100 n-type As doped with a resistivity
0.004– 0.006 cm and a thickness e 100 m. The
preparation of the silicon sample starts by resistively heating
to 650 °C for a predegassing period of about 12 h. The
sample holder is then cooled to 6 K with a liquid He cir-
culation through the manipulator while the heating of the
sample is kept fixed. We then proceed to rapidly flash the
sample as explained in other works,
10
with a slow decline in
temperature from 950 to 750 °C. The sample is then cooled
back down to 6 K and transferred into the STM chamber at
this temperature. This procedure allows us to obtain very
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