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Ultralight High-Efficiency Flexible InGaP/(In)GaAs Tandem
Solar Cells on Plastic
Davood Shahrjerdi,* Stephen W. Bedell, Can Bayram, Cristina C. Lubguban, Keith Fogel,
Paul Lauro, John A. Ott, Marinus Hopstaken, Michael Gayness, and Devendra Sadana
D. Shahrjerdi, S. W. Bedell, C. Bayram,
C. C. Lubguban, K. Fogel, P. Lauro, J. A. Ott,
M. Hopstaken, M. Gayness, D. Sadana
IBM T. J. Watson Research Center
Yorktown Heights, NY 10598
E-mail: davood@us.ibm.com
DOI: 10.1002/aenm.201200827
Flexible solar cells are envisioned to open up a myriad of pos-
sibilities for enabling new applications in consumer electronics
and space satellites.
[1–3]
Organic and amorphous semiconduc-
tors hold a great promise for realizing bendable and light-weight
solar cells, largely due to their fairly strong light absorption
properties, process temperature compatibility with flexible sub-
strates and potentially inexpensive processing cost.
[4–6]
However,
the poor minority carrier lifetime in these materials, inherent
to their highly disordered and defective crystalline structure,
inhibit their use for making high efficiency and reliable solar
cells. This limitation becomes more pronounced in applica-
tions with stringent specifications in terms of the total area and
weight of the photovoltaic (PV) module.
Conversely, the exquisite optical and electrical properties
of III–V semiconductors permit the fabrication of extremely
high-efficiency solar cells exploiting thin III–V layers.
[7–9]
For
example, multijunction III–V solar cells have currently reached
≥36% conversion efficiency at one sun intensity, for which the
total thickness of the solar cell structure is ≤ 10 μm.
[10]
How-
ever, III–V solar cells are conventionally grown on mechanically
rigid gallium arsenide (GaAs) and germanium (Ge) substrates
that serve as an epitaxial template. Therefore, the release of thin
III–V layers from the growth substrate is essential for rendering
the solar cell structure flexible. Furthermore, there has been a
growing interest in exploiting inverted metamorphic structures
to attain higher conversion efficiency, in which the removal of
the solar cell structure from the growth substrate is necessary
for the proper function of the device.
[7,10]
It is also important to
consider that the use of a viable layer transfer scheme will ide-
ally lead to substantial reduction in material cost by enabling
(i) substrate reuse and (ii) thinner solar cell structures with poten-
tially higher conversion efficiency utilizing back reflectors.
[11,12]
In order for the widespread adoption of a layer transfer tech-
nology, it should offer process simplicity and compatibility
with an incumbent solar cell technology, while making it more
cost-effective. Recently, there has been an enormous effort to
revive the epitaxial layer lift-off (ELO) technique for separating
III-V solar cell layers from a GaAs host substrate.
[12–17]
This
technique, in principle, relies on the selective lateral etch of an
embedded sacrificial layer – usually an Al-rich AlGaAs layer.
[18]
From a practical standpoint, an additional apparatus is required
to progressively pull the lifted layer away from the host wafer
while the sample is immersed in the etch solution – generally
concentrated hydrofluoric acid.
[14]
This is to enhance the inher-
ently slow lateral etch rate of the embedded sacrificial layer and
avoid the sudden halt of the etch process. Hence, these practical
pitfalls combined with difficulties in handling the free-standing
thin layers – particularly film cracking issues during the release
process – severely hamper the simplicity and applicability of
this method when larger size wafers are used.
We have previously demonstrated the use of our novel layer
transfer technique, called controlled spalling for realizing thin-
film tandem junction InGaP/(In)GaAs/Ge solar cells rigidly
bonded on silicon (Si) handle substrates.
[19]
This technique
works based on the propagation of a spalling mode fracture
inside the substrate parallel to the surface, wherein the frac-
ture front is mechanically guided using a flexible handle layer
in a controllable manner.
[20,21]
The equilibrium fracture depth
inside the substrate and the final residual strain in the trans-
ferred film is engineered by adjusting the intrinsic proper-
ties of the stressor layer, which is generally nickel (Ni) owing
to its superb fracture toughness. Most notably, the Ni stressor
in conjunction with the flexible handle layer provides a robust
mechanical support that remarkably facilitates manipulation of
very thin layers. The details of the controlled spalling have been
described elsewhere.
[20,21]
We report here ultralight flexible dual-junction InGaP/(In)
GaAs solar cells on plastic with conversion efficiency ≥28%
employing the controlled spalling technique. Our solar cells
exhibit remarkably high specific power and excellent stability
under different bending conditions, thus demonstrating their
suitability for applications requiring light-weight and high-
efficiency flexible PV. Finally, we demonstrate that the integrity
of the entire device structure is maintained during the layer
transfer process.
An inverted dual-junction InGaP/(In)GaAs solar cell struc-
ture, schematically illustrated in Figure 1a, was devised and
grown on germanium substrates. In this structure, Ge wafer
serves only as an epitaxial template and is not part of the solar
cell. However, the growth of an (In)GaAs buffer layer on Ge
is necessary to terminate anti-phase boundary defects prior to
the growth of the solar cell structure. Because of slight lattice
mismatch between GaAs and Ge, it is imperative to incorporate
precisely 1% indium in GaAs while growing the buffer layer
and the bottom cell in order to avoid the formation of misfit dis-
locations. It has been previously reported that the misfit dislo-
cations result in the degradation of the open circuit voltage ( V
oc
)
without causing an apparent change in the spectral response
Adv. Energy Mater. 2012,
DOI: 10.1002/aenm.201200827