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Intriguing morphological evolution during chemical vapor deposition of HfS
2
using HfCl
4
and S on sapphire substrate
Mirine Leem, Hyangsook Lee, Taejin Park, Wonsik Ahn, Hoijoon Kim,
Eunha Lee, Hyoungsub Kim
PII: S0169-4332(19)33517-2
DOI: https://doi.org/10.1016/j.apsusc.2019.144701
Reference: APSUSC 144701
To appear in: Applied Surface Science
Received Date: 20 August 2019
Revised Date: 30 October 2019
Accepted Date: 14 November 2019
Please cite this article as: M. Leem, H. Lee, T. Park, W. Ahn, H. Kim, E. Lee, H. Kim, Intriguing morphological
evolution during chemical vapor deposition of HfS
2
using HfCl
4
and S on sapphire substrate, Applied Surface
Science (2019), doi: https://doi.org/10.1016/j.apsusc.2019.144701
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