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Copyright: American Scientific Publishers
RESEARCH ARTICLE
Copyright © 2011 American Scientific Publishers
All rights reserved
Printed in the United States of America
Journal of
Nanoscience and Nanotechnology
Vol. 11, 4919–4922, 2011
Carbon Nanotube Crossed Junction by
Two Step Dielectrophoresis
Anupama Arun, Paul Salet, and Adrian M. Ionescu
∗
ELB 335, Station 11, Nanolab, EPFL, Lausanne, 1015, Switzerland
The crossed junction formed between a multi walled carbon nanotube (MWCNT) and a bundle of
single walled carbon nanotube (SWCNT) is investigated. The junction is fabricated by orthogonally
assembling the MWCNT and SWCNT by a two-step dielectrophoresis process. The conventional
dielectrophoresis method to self-assemble carbon nanotubes has been modified to be able to align
single MWCNT and SWCNT at predefined location on a substrate. At room temperature, the junction
has an ohmic behavior with junction resistance of about 500 K or a conductance of 0.05 (e
2
/h). At
77 K, the onset of a Schottky-like behavior was observed. The resulting junction has an extremely
tiny area of less than 20 nm
2
and yet supports a current density of 10
7
A/cm
2
at 1 V. The proposed
fabrication technique is a convenient way to fabricate novel prototype devices to investigate material
properties and new device architecture. Following further optimization, this cross-junction can be
an interesting candidate for cross-bar like interconnects, with potential applications in dense logic
and memory circuits.
Keywords: Carbon Nanotubes, Crossed-Junction, Dielectrophoresis, Self-Assembly.
1. INTRODUCTION
Carbon nanotubes (CNT) have been of significant inter-
est for both fundamental research and for practical elec-
tronic circuit applications. With Moore’s law reaching its
physical limit, different device architectures and materials
(CNTs, Si nanowires etc.) have been considered as alterna-
tive solutions. In particular, cross bar architecture has been
proposed for memory application,
1
nano-electromechnical
systems
2
and quantum system.
3
Cross-bar architectures
need ultra-scaled memory devices at the crossing points
between nanowires and/or nanotubes. The purpose of this
work is to fabricate such cross junctions between two
carbon nanotubes and investigate their electrical property.
Despite significant research in the field of CNT growth,
it is still a challenge to fabricate high quality CNTs on
silicon substrate with controlled orientation of growth.
4
CNT growth is a high temperature process and is often
difficult to integrate CNTs for device application. CNT
growth directly on the substrate is typically done by chem-
ical vapor deposition process which results in more defec-
tive tubes compared to arc-discharge technique. In the
recent years dielectrophoresis technique has emerged as
an alternative technique to orient the CNTs.
5–7
The critical
∗
Author to whom correspondence should be addressed.
advantage with this technique is the possibility to locally
deposit single walled carbon nanotubes (SWCNT) and
multi walled carbon nanotubes (MWCNT). It is a low tem-
perature process and hence is CMOS compatible. Apart
from being a low temperature process dielectrophore-
sis also provides the possibility to integrate high quality
tubes produced by techniques such as arc discharge and
laser ablation for device application. In Ref. [8] SWCNT–
SWCNT junction was studied, where CNTs are randomly
dispersed on the substrate and the eventual device fabri-
cation involved a cumbersome step of locating the CNTs
by AFM. In this work, a two-step dielectrophoresis has
been used for the first time to form a SWCNT–MWCNT
junction (MWCNT with diameter of ∼20 nm, and bun-
dles of SWCNT with diameter of ∼10 nm), which pro-
vides better control over the process than the technique
used in Ref. [8]. The technology described here could be
envisaged to fabricate nano-electromechanical systems as
in Ref. [2].
2. FABRICATION DETAILS
Dielectrophoresis is defined as the motion of matter caused
by polarization effects in non-uniform electric field.
9
Typ-
ically an array of CNTs are aligned across two electrodes
using this technique.
5
With a modified dielectrophoresis
J. Nanosci. Nanotechnol. 2011, Vol. 11, No. 6 1533-4880/2011/11/4919/004 doi:10.1166/jnn.2011.4116 4919