Optical and electrical properties of Ti-doped In2O3 ヲlm deposited on ァexible transparent substrates by ion beam assisted deposition under different oxygen ァow rate Pakpoom Chansri ( pakpoom.cha@kmutt.ac.th ) King Mongkut's University of Technology Thonburi https://orcid.org/0000-0003-4595-0926 Pattarapon Pooyodying Department of Electrical Engineering, Rajamangala University of Technology Rattanakosin Youl Moon Sung Department of Electrical Engineering, Kyungsung University Article Keywords: titanium doped indium oxide, oxygen ァow rate, ion beam-assisted deposition, ァexible transparent substrates Posted Date: August 23rd, 2021 DOI: https://doi.org/10.21203/rs.3.rs-833438/v1 License: This work is licensed under a Creative Commons Attribution 4.0 International License. Read Full License