Self-Assembled n-Alkanethiolate Monolayers on
Underpotentially Deposited Adlayers of Silver and Copper on
Gold
G. Kane Jennings and Paul E. Laibinis*
Contribution from the Department of Chemical Engineering, Massachusetts Institute of
Technology, Cambridge, Massachusetts 02139
ReceiVed August 23, 1996
X
Abstract: This paper describes the use of gold films that contain underpotentially deposited (upd) metal layers of
copper or silver as substrates in the generation of self-assembled monolayers (SAMs). The assembly of alkanethiols
to form SAMs is compatible with the presence of the upd layer and forms a system that contains an interlayer of the
upd metal that is between the gold substrate and the adsorbed organic monolayer. The assembly on these substrates
can accommodate both polar and nonpolar tail groups, and the resulting SAMs span the range of wettabilities (θ
a
-
(H
2
O) )<15° to 113°). The SAMs on the upd substrates have highly organized structures that are distinct from
those that form on the parent bulk metal surfaces. In addition, the upd metal has a more noble redox potential than
the corresponding bulk metal and allows an expanded potential window in cyclic voltammetry. For example, ferrocene-
terminated alkanethiolssdespite having redox potentials that are positive of bulk silverscan be assembled onto
silver upd substrates and form stable electroactive SAMs. The presence of the upd layer improves the stability of
alkanethiolate monolayers against both desorption at elevated temperatures and molecular exchange within thiol-
containing solutions.
Introduction
Advances in materials chemistry rely on the ability to tailor
the structure and composition within the bulk and at interfaces
at the nanoscopic level.
1
Indeed, the ability to generate systems
with higher levels of organization and structural complexity is
a focus of many areas of current research. Supramolecular
assemblies,
2
self-assembled structures,
3
heteroelement compos-
ites,
4
and bimetallic catalysts
5
are examples where molecular
(or atomic-scale) engineering has produced species with novel
architectures, synthetic flexibility, and tailored properties.
At metal surfaces, two strategiessthe formation of self-
assembled monolayers (SAMs)
6
and the process of underpo-
tential deposition (upd)
7
shave provided useful means for
functionalizing the surface and tailoring its properties. These
methods functionalize the surface with a highly organized single
layer of material, where the composition of the layer is readily
controlled. The difference between these methods is that the
self-assembly method produces a thin organic layer on the metal
surface and the upd procedure coats the metal surface with a
one-atom-thick layer of a dissimilar metal.
Self-assembled monolayers (SAMs) form by the spontaneous
adsorption of organic molecules onto a metal or metal oxide
surface.
6
Various systems are presently available, with the
assembly of n-alkanethiols onto copper,
8,9
silver,
8-12
and
(particularly) gold
6,8,13
being the most investigated. On these
metals, the thiols form a densely packed, oriented monolayer
and the hydrocarbon chains pack in a trans-zigzag-extended
structure.
8,10
The assemblies are the product of strong metal-
sulfur interactions that are also responsible for the robust nature
of the SAM in liquid and vacuum environments. A notable
feature of these assemblies is their ability to accommodate a
wide range of polar and nonpolar functionalities in the tail group
of the adsorbate.
9,13
This flexibility in their synthesis has
allowed the formation of tailored organic surfaces for studies
of wetting,
9,12,14
adhesion,
15
biocompatibility,
16
friction,
17
and
interfacial electron transfer.
18
X
Abstract published in AdVance ACS Abstracts, May 1, 1997.
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