Pulsed Laser Deposition of Nanostructured Indium-Tin-Oxide Film Thian Kok Yong a,b , Chen Hon Nee a , Seong Shan Yap a,c,* , Wee Ong Siew a , György Sáfran b , Yoke Kin Yap c and Teck Yong Tou a , a Faculty of Engineering, Multimedia University, Cyberjaya, Selangor, Malaysia a,b Present Address : Faculty of Engineering and Science, Universiti TAR, Kuala Lumpur, Malaysia a,c Present Address : Institute of Physics, Norwegian University of Science and Technology,7491 Trondheim, Norway b Research Institute for Technical Physics and Materials Science, Hungarian Academy of Sciences, Konkoly Thege út 29-33, Budapest XII, Hungary. c Department of Physics, Michigan Technological University, 1400 Townsend Drive, Houghton, MI , USA, 49931-1295. ABSTRACT Effects of O 2 , N 2 , Ar and He on the formation of micro- and nanostructured indium tin oxide (ITO) thin films were investigated in pulsed Nd:YAG laser deposition on glass substrate. For O 2 and Ar, ITO resistivity of ≤ 4 × 10 -4 Ωcm and optical transmittance of > 90% were obtained with substrate temperature of 250 °C. For N 2 and He, low ITO resisitivity could be obtained but with poor optical transmittance. SEM images show nano-structured ITO thin films for all gases, where dense, larger and highly oriented, microcrystalline structures were obtained for deposition in O 2 and He, as revealed from the XRD lines. EDX results indicated the inclusion of Ar and N 2 at the expense of reduced tin (Sn) content. When the ITO films were applied for fabrication of organic light emitting devices (OLED), only those deposited in Ar and O 2 produced comparable performance to single-layer OLED fabricated on the commercial ITO. . Keywords: Indium-tin-oxide (ITO), pulsed laser deposition (PLD), organic light emitting diode (OLED), nanostructures, nanorod, transparent conducting oxide. 1. INTRODUCTION Indium tin oxide (ITO) has been used the hole-injection anode [1] in the organic light emitting device (OLED). These are commonly coated on glass substrate by the magnetron sputtering [2-3], spray pyrolysis [4], electron beam evaporation [5] and the pulsed laser deposition (PLD) [6-12]. The PLD deposition usually employs either a KrF or ArF excimer laser. For example, Kim et al. [7-8] reported a low resistivity of 2.0 × 10 -4 Ωcm with a maximum optical transmission of 92% in the visible region, which was used for the fabrication of OLED. The OLED performance was comparable to that fabricated using the commercial ITO. * seong.yap@ntnu.no Nanostructured Thin Films III, edited by Raúl J. Martin-Palma, Yi-Jun Jen, Akhlesh Lakhtakia, Proc. of SPIE Vol. 7766, 776615 · © 2010 SPIE · CCC code: 0277-786X/10/$18 · doi: 10.1117/12.869561 Proc. of SPIE Vol. 7766 776615-1 Downloaded From: http://proceedings.spiedigitallibrary.org/ on 07/02/2016 Terms of Use: http://spiedigitallibrary.org/ss/TermsOfUse.aspx