Vol.:(0123456789) 1 3
Metals and Materials International
https://doi.org/10.1007/s12540-020-00861-z
Nitrogen Ions Implantation in W‑Based Quad Alloy: Structure,
Electrical Resistivity, Surface Roughness and Vickers Hardness
as a Function of Ion Dose
Muhammad Zakria Butt
1
· Dilawar Ali
2
· Muzamil Aftab
1
· Farooq Bashir
3
· M. Shahid Pervaiz
1
·
M. Usman Tanveer
1
· M. Waqas Khaliq
1
Received: 8 June 2020 / Accepted: 17 August 2020
© The Korean Institute of Metals and Materials 2020
Abstract
Five W-alloy specimens, containing 8.57% Ni, 6.34% Cu, and 1.34% Mo, were bombarded with 5.2 MeV singly charged
nitrogen ions. The ions dose range was 5 × 10
14
–1 × 10
16
ions/cm
2
. XRD patterns portrayed diffraction peaks of pure W as
well as of Cu
0.4
W
0.6
, MoNi
4
, and Ni
4
W phases. Harris analysis showed that the preferentially oriented planes depend on the
nitrogen ions dose. The structural parameters, namely lattice strain and crystallite size, vary with nitrogen ions dose alike.
Same pattern is followed by surface hardness and electrical resistivity. The increase in the values of all the parameters with
ions dose is rapid in the range 0–1 × 10
15
ions/cm
2
and later on slow till the maximum ions dose 1 × 10
16
ions/cm
2
. How-
ever, the interdependence of each parameter on the other ones was linear. Surface roughness of the specimens was found to
decrease on increasing ions dose. On the other hand, surface hardness registers a rise as crystallite size increases, and hence
follows Inverse Hall–Petch relation.
Keywords W-alloy · N
+1
ions implantation · Structural analysis · Electrical resistivity · Scanning electron microscopy ·
Surface hardness
1 Introduction
It is well established that nitrogen implantation in metals,
alloys, and composite materials can modify their surface
properties [e.g. 1–8]. The main features of interest are sur-
face hardness, resistance to wear, friction coefficient, fatigue
resistance, crystallite size, corrosion performance, and for-
mation of chemical compounds, etc.
Yabe et al. [1] implanted thirteen 99.9% pure metals
(Cu, Al, Ni, W, Fe, Nb, Ta, V, Co, Mo, Sn, Ti and Zr) with
150 keV nitrogen molecular ions using doses of 3 × 10
17
and
1 × 10
18
ions/cm
2
. The surface layers of the implanted metals
were analyzed by means of RBS and XRD techniques. For
the smaller 3 × 10
17
ions/cm
2
dose, the implanted layer of
target metals was nitrided only to some extent. In Ta, V,
Ti and Zr target metals, solid solution formation occurred
together with an isotropic expansion of the lattice of V and
Ta (cubic metals) and an anisotropic c-direction expansion
in Ti and Zr lattice (hexagonal metals). When the implanted
region was saturated with nitrogen, the nitride formed was
quite stable. The quantity of nitrogen retained in the target
metal increased whereas the heat of formation of the nitride
decreased. The amount of nitrogen retained was a function
of the reactivity of target metal to nitrogen.
Zhang et al. [2] investigated the influence of 40 keV N
+
ions implantation on the surface of W specimens. The
implantation doses used were 4 × 10
17
, 8 × 10
17
, and
1.6 × 10
18
ions/cm
2
. Characterization of the specimens
was done by XRD and XPS techniques. WN and W
x
(O, N)
phases was formed in the target near-surface layer due to N
+
ions implantation. The concentration of WN phase increased
with the increase in N
+
ions dose which was accompanied by
concomitant decrease in concentration of W
x
(O, N).
* Muhammad Zakria Butt
mzakriabutt@gmail.com
1
Centre for Advanced Studies in Physics, GC University,
Lahore 54000, Pakistan
2
Department of Physics, GC University, Lahore 54000,
Pakistan
3
Central Research Laboratories, LCW University,
Lahore 54000, Pakistan