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Computer modelling of Bi
12
SiO
20
and Bi
4
Si
3
O
12
: Intrinsic defects and rare earth ion
incorporation
Marcos V. dos S Rezende, Carlos W.A. Paschoal, Mário E.G. Valerio, Robert A.
Jackson
PII: S0022-4596(20)30438-2
DOI: https://doi.org/10.1016/j.jssc.2020.121608
Reference: YJSSC 121608
To appear in: Journal of Solid State Chemistry
Received Date: 15 June 2020
Revised Date: 22 July 2020
Accepted Date: 22 July 2020
Please cite this article as: M.V. dos S Rezende, C.W.A. Paschoal, Má.E.G. Valerio, R.A. Jackson,
Computer modelling of Bi
12
SiO
20
and Bi
4
Si
3
O
12
: Intrinsic defects and rare earth ion incorporation,
Journal of Solid State Chemistry (2020), doi: https://doi.org/10.1016/j.jssc.2020.121608.
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