Transferable resistively heated metal evaporator for ultrahigh vacuum Thomas G. Drummond, James S. Burgess, William T. Wallace, and Andrew J. Leavitt Citation: Journal of Vacuum Science & Technology A 17, 668 (1999); doi: 10.1116/1.581634 View online: http://dx.doi.org/10.1116/1.581634 View Table of Contents: http://scitation.aip.org/content/avs/journal/jvsta/17/2?ver=pdfcov Published by the AVS: Science & Technology of Materials, Interfaces, and Processing Articles you may be interested in Confocal single molecule fluorescence spectroscopy in ultrahigh vacuum Rev. Sci. Instrum. 80, 103101 (2009); 10.1063/1.3238505 Compact and transferable threefold evaporator for molecular beam epitaxy in ultrahigh vacuum Rev. Sci. Instrum. 76, 083906 (2005); 10.1063/1.2001665 Resistively heated molecular beam doser for water deposition in ultrahigh vacuum J. Vac. Sci. Technol. A 19, 1030 (2001); 10.1116/1.1368838 Temperature stabilized effusion cell evaporation source for thin film deposition and molecular-beam epitaxy Rev. Sci. Instrum. 71, 2121 (2000); 10.1063/1.1150592 Ultrahigh vacuum sample heating stage for molecular beam epitaxy applications with transfer mechanism to a remote scanning tunneling microscope J. Vac. Sci. Technol. B 16, 1258 (1998); 10.1116/1.589997 Redistribution subject to AVS license or copyright; see http://scitation.aip.org/termsconditions. Download to IP: 137.189.170.231 On: Sun, 21 Dec 2014 02:13:23