Energy level alignment and chemical interaction at Alq
3
Õ Co interfaces for organic
spintronic devices
Y. Q. Zhan,
1,
* M. P. de Jong,
1,†
F. H. Li,
1
V. Dediu,
2
M. Fahlman,
1
and W. R. Salaneck
1
1
Department of Physics, Chemistry, and Biology, Linköping University, S-581 83 Linköping, Sweden
2
Istituto per lo Studio di Materiali Nanostrutturati, Consiglio Nazionale delle Ricerche (ISMN-CNR), via Gobetti 101,
40129 Bologna, Italy
Received 19 March 2008; revised manuscript received 10 June 2008; published 16 July 2008
The electronic structure of the interface between tris8-hydroxyquinoline aluminum Alq
3
and cobalt was
investigated by means of photoelectron spectroscopy. As demonstrated recently, this interface is characterized
by efficient spin injection in organic spintronic devices. A strong interface dipole that reduces the effective
work function of cobalt by about 1.5 eV was observed. This leads to a large barrier for hole injection into the
highest occupied molecular-orbital HOMO level of 2.1 eV, in agreement with a previously proposed model
based on electron transport in Co-Alq
3
-La
0.7
Sr
0.3
MnO
3
spin valves. Further experimental results indicate that
chemical interaction occurs between the Alq
3
molecules and the cobalt atoms, while the latter penetrate the
Alq
3
layer upon vapor deposition of Co atoms. The data presented lead to significant progress in understanding
the electronic structure of the Co-on-Alq
3
interface and represent a significant step toward the definition of the
interface parameters for the efficient spin injection in Alq
3
based spin valves.
DOI: 10.1103/PhysRevB.78.045208 PACS numbers: 72.80.Le, 85.75.d, 71.20.b, 73.40.c
I. INTRODUCTION
Organic/ferromagnetic electrode interfaces have recently
become the subject of thorough studies
1–4
because of their
applications in organic spintronics.
5–7
In this promising field,
the organic semiconductors are mainly used as a spin trans-
port layer placed between two ferromagnetic electrodes. The
electronic structure of the organic/ferromagnetic electrode
interface was not only found to be the main factor determin-
ing charge injection but also the possible reason for a nega-
tive spin-valve effect.
8
Among many different organic spin-
tronic devices, those using tris8-hydroxyquinoline
aluminum Alq
3
, shown in Fig. 1 as a spacer between the
ferromagnetic La
0.7
Sr
0.3
MnO
3
LSMO and Co electrodes
have been mostly used.
6,9,10
Recently, the alignment of en-
ergy levels at the Alq
3
-on-LSMO interface was studied
1
and
the existence of a strong dipole of about 0.9 eV that shifts
down the energy levels of Alq
3
was reported.
1
The results
indicate that electrons injected from LSMO into Alq
3
are the
dominant charge carriers in the spin-valve device. However,
the behavior of these spin-valve devices was only partially
understood, mainly because the knowledge about the inter-
face between cobalt electrode and the Alq
3
molecular layer
was insufficient. Thus far, only the interface formed by ad-
sorbing Alq
3
-on-cobalt electrodes Alq
3
/ Co has been dis-
cussed in the literature.
11
In the standard organic spin-valve
devices, however, cobalt is deposited onto a surface of Alq
3
i.e., Co / Alq
3
. It is well known that significantly different
interfaces may be formed depending upon the order of depo-
sition. For example, if Al atoms are deposited on LiF / Alq
3
surfaces, there is a chemical reaction between the Al atoms
and the LiF Ref. 12 that does not occur when Alq
3
atoms
are deposited on Al/LiF Ref. 13.
In this paper, the results of studies of both Co / Alq
3
and
Alq
3
/ Co interfaces using ultraviolet and x-ray photoelectron
spectroscopy UPS and XPS, respectively are reported. In
particular, the interfacial energy level alignment at the inter-
face of cobalt and Alq
3
is presented.
II. EXPERIMENTAL DETAILS
The experiments were carried out using a Scienta
®
ESCA
200 spectrometer. The vacuum system consists of an analysis
chamber and a preparation chamber. X-ray photoelectron
spectroscopy XPS and ultraviolet photoelectron spectros-
copy UPS were performed in the analysis chamber at a
base pressure of 10
-10
mbar using monochromatized AlK
x rays at h =1486.6 eV and He I radiation at h = 21.2 eV,
respectively. The experimental conditions were such that the
full width at half maximum FWHM of the Au 4 f
7/2
line
was 0.65 eV. The binding energies were obtained referenced
to the Fermi level with an error of 0.1 eV. Sputtering and
material depositions were done in a preparation chamber
with a base pressure of 10
-10
mbar. The Alq
3
was purchased
from Sigma-Aldrich. Alq
3
was deposited in situ from a
Alq3
Co
Carbon tape
Si
Si
nm
0 4 m
35
-35
FIG. 1. Color online Schematic of the peel-off technique and
the AFM image measured around the edge formed by the peel-off
process.
PHYSICAL REVIEW B 78, 045208 2008
1098-0121/2008/784/0452086 ©2008 The American Physical Society 045208-1