Nearest-neighbor distributions in Ga
1-x
In
x
N
y
As
1-y
and Ga
1-x
In
x
N
y
As
1-y-z
Sb
z
thin films
upon annealing
Vincenzo Lordi,* Homan B. Yuen, Seth R. Bank, Mark A. Wistey, and James S. Harris
Solid State and Photonics Laboratory, Stanford University, Stanford, California 94305, USA
Stephan Friedrich
Advanced Detector Group, Lawrence Livermore National Laboratory, Livermore, California 94550, USA
Received 19 May 2004; revised manuscript received 6 December 2004; published 15 March 2005
We examine the distribution of N-In nearest-neighbor bonds in GaInNAsSb quantum wells QWs and
observe quantitatively the evolution of the distribution during thermal annealing. We use near-edge x-ray
absorption fine structure to compare the behavior of compressively strained quantum wells with relaxed
thick-film samples, and find no significant effect of strain on the nearest-neighbor bonding. Photoluminescence
PL and electroreflectance ER spectroscopies are used to quantitatively measure the distribution of N-In
nearest-neighbor states for a series of variously annealed GaInNAsSb QW samples. We find that increased
annealing temperature or time leads to a blueshift of the band gap that saturates after sufficient annealing. This
saturation is related to a thermodynamic equilibration of the N-In nearest-neighbor bonding in the material
toward highly In-coordinated states, from an as-grown material having a nearly random bonding arrangement
dominated by N-Ga bonds. The different N-In nearest-neighbor states form a fine splitting of the band gap of
the material. The average spacing between these levels is found to be considerably smaller for GaInNAsSb
18 meV than for GaInNAs 35 meV. Furthermore, we present absorption measurements that reveal an
increased optical efficiency of the higher In-coordinated N states that form upon annealing. Additionally, the
line shape observed at room temperature in all of the spectroscopic measurements is Gaussian, indicating a
strong exciton-phonon coupling in these alloys.
DOI: 10.1103/PhysRevB.71.125309 PACS numbers: 78.20.Ci, 61.10.Ht, 78.67.De, 81.40.Tv
I. INTRODUCTION
The GaInNAs material system has received much atten-
tion over the past decade for its potential use in low-cost
telecommunications optoelectronic devices operating in the
1.3–1.6 μm wavelength range.
1–3
The advantages of this ma-
terial system stem from its ability to be grown on GaAs
substrates and the possibility for monolithic integration of
highly reflective distributed Bragg reflectors, which enable
the fabrication of low-cost vertical cavity lasers as well as
resonant cavity detectors and modulators. These devices can
be applied in high volume to address the current bottlenecks
in optical networks and also to enable low-voltage optical
interconnects. Recent progress on the use of GaInNAs for
these applications has succeeded in producing devices oper-
ating at up to 1.4 μm wavelength.
2,4
In the past few years,
GaInNAsSb has been found to be a potentially superior ma-
terial to GaInNAs for these applications, since higher quality
material can be grown over the entire telecommunications
wavelength range and particularly at the longest wavelengths
that were previously unattainable. In addition, inherent ad-
vantages are expected for GaInNAsSb over the competing
material grown on InP InGaAsP, due to a heavier electron
effective mass, better electron confinement in quantum wells,
and higher differential gain. High-performance device char-
acteristics have been demonstrated with GaInNAsSb for
wavelengths spanning the 1.3–1.6 μm range.
5–8
Understanding the intricacies of the atomic structure and
bonding in these dilute nitride materials is important for both
improving the material quality and understanding the unique
properties they exhibit, such as the blueshift of the band gap
upon thermal annealing and the giant reduction of the band
gap upon addition of small amounts of N.
9–15
We have re-
cently used x-ray absorption spectroscopy XAS to directly
examine the N-In nearest-neighbor bonding in thick films of
Ga
0.7
In
0.3
N
0.03
As
0.97
and probe how it changes with
annealing.
9
A shift in the nearest-neighbor distribution to-
ward increased N-In bonding was found to occur and to cor-
respond to a thermodynamic stabilization of the material as
well as to the observed blueshift in the band gap.
In this paper, we examine first the effect of biaxial com-
pressive strain, which is present in the technologically rel-
evant thin films used in optoelectronic devices, on the N-In
nearest-neighbor bonding, using XAS. We find that strain
does not alter the random nature of bonding in as-grown
material nor does it change the atomic reconfiguration be-
havior upon annealing. We also observe the N-In nearest-
neighbor states in thin-film GaInNAsSb material, using vari-
ous spectroscopic techniques, including photoluminescence,
electroreflectance, and optical absorption. The presence of
Sb a Group V element is found not to affect the N-In bond-
ing to first order. With electroreflectance we are able to dis-
tinguish each of the N-In nearest-neighbor states and extract
bonding distributions in a series of partially annealed quan-
tum well samples. Assignments of individual bonding states
in the spectra are possible by using the results of the XAS
experiments and ab initio band-structure calculations. We
find that, like GaInNAs, as-grown GaInNAsSb material con-
tains a nearly random distribution of N-In bonds, while an-
nealing drives the material toward a state with increased
N-In bonding and a larger band gap. The evolution of these
states is monitored quantitatively during annealing.
PHYSICAL REVIEW B 71, 125309 2005
1098-0121/2005/7112/1253098/$23.00 ©2005 The American Physical Society 125309-1