A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio This article has been downloaded from IOPscience. Please scroll down to see the full text article. 2013 J. Micromech. Microeng. 23 035038 (http://iopscience.iop.org/0960-1317/23/3/035038) Download details: IP Address: 192.122.131.20 The article was downloaded on 13/02/2013 at 02:14 Please note that terms and conditions apply. View the table of contents for this issue, or go to the journal homepage for more Home Search Collections Journals About Contact us My IOPscience