This content has been downloaded from IOPscience. Please scroll down to see the full text. Download details: IP Address: 193.205.207.35 This content was downloaded on 07/01/2015 at 09:58 Please note that terms and conditions apply. PECVD low stress silicon nitride analysis and optimization for the fabrication of CMUT devices View the table of contents for this issue, or go to the journal homepage for more 2015 J. Micromech. Microeng. 25 015012 (http://iopscience.iop.org/0960-1317/25/1/015012) Home Search Collections Journals About Contact us My IOPscience