IOP PUBLISHING NANOTECHNOLOGY
Nanotechnology 19 (2008) 145703 (5pp) doi:10.1088/0957-4484/19/14/145703
Band offsets and photocurrent
spectroscopy of Si/Ge heterostructures
with quantum dots
S V Kondratenko
1
, A S Nikolenko
1
, O V Vakulenko
1
, M Ya Valakh
2
,
V O Yukhymchuk
2
, A V Dvurechenskii
3
and A I Nikiforov
3
1
Kyiv National Taras Shevchenko University, Physics Department, 2 Academician Glushkov
Avenue, Kyiv 03022, Ukraine
2
Lashkaryov’s Institute of Semiconductor Physics, NAS of Ukraine, 45 Prospekt Nauky,
Kyiv 03028, Ukraine
3
Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Sciences,
Prospekt Lavrent’eva 13, 630090 Novosibirsk, Russia
E-mail: kondr@univ.kiev.ua
Received 10 October 2007, in final form 23 January 2008
Published 5 March 2008
Online at stacks.iop.org/Nano/19/145703
Abstract
Raman and lateral photoconductivity spectra of self-assembled SiGe nanoislands were studied
with a height of ∼2 nm and a base of ∼20 nm formed at a temperature of 500
◦
C. It was
estimated that the value of elastic deformation (ε
xx
) was −0.022 (ε
zz
= 0.017), while the
germanium content in the islands (x ) was 0.66. The obtained values of x and ε were used to
calculate band offsets at the interfaces and the energy of interband transitions of structures
under study. It was shown that the minimal energy of photocurrent observation is 0.52 eV,
which is below the bandgap of the QDs under study. The first photocurrent component which
began to contribute at 0.52 eV and had a peak at 0.68 eV is explained by optical transitions of
electrons from the QD HH localized states of the valence band to the conduction band
2
valley
of the surrounding silicon matrix in which tensile strains are present. The second component
with limiting energy of 0.73 eV can be caused by interband electron transitions from the HH
valence band of the QDs to the
4
valley of the QD conduction band.
1. Introduction
Great interest in Si/Ge heterostructures formed on the basis of
Ge quantum dots (QDs) embedded in an Si matrix is caused
by the possibility of their use for the formation of active
elements of microchips and photodetectors with improved
characteristics as compared with 3D structures and the creation
of principally new electronic and optoelectronic devices [1–3].
Quantum dots formed by the Stranski–Krastanow mechanism
due to the difference in Ge and Si lattice constants (∼4%) are
stressed and have nonuniform composition due to the processes
of Si–Ge intermixing at 300–700
◦
C[4–6]. A specific feature
of these structures is the presence of nonuniform stresses both
in the QDs and in the surrounding Si matrix. The energy
spectrum of such structures is modified due to the quantum
confinement effect and mechanical strains. Besides, the
latter causes the QD component intermixing, which depends
on the growth conditions, and affects the energy spectrum.
Knowledge of the specific features of the energy spectrum
and band alignment of the QDs embedded in the Si matrix
is necessary for the development of electronic devices on the
basis of such structures.
Spatially direct and indirect interband transitions in SiGe
heterostructures with QDs were studied by luminescence
spectroscopy [7, 8], photocurrent spectroscopy [9–11] and
optical absorption spectroscopy [12]. The intraband absorption
due to transitions between confined holes and band-to-
continuum electron transitions allows one to use such
structures as infrared quantum dot photodetectors.
The information about band offsets of the Si/SiGe
interface is important from the practical point of view. This
work is devoted to the analysis of lateral photoconductivity
spectra and the calculation of the heterojunction band diagram
using the values of strain and composition obtained from
Raman scattering (RS) measurements.
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