Vacuum 70 (2003) 397–402 Field electron emission from laser the engraved surface Z. Znamirowski a , W. Czarczynski a , L. Pawlowski b , A. Le Maguer b a Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, ul. Janiszewskiego 11/17, Wroclaw 50-370, Poland b Laboratoire de Cristallochimie et Physicochimie du Solide, UMR CNRS 8012, ENSCL, USTL, B.P. 108–59652 Villeneuve d’Ascq, France Abstract Laser engraved surface of thick layer of plasma sprayed ceramic (mainly Cr 2 O 3 ) covered with the thin Ti layer appeared to be an effective field electron emitter (Surf. Coat. Technol. J., submitted for publication; Patent pending: method of field electron emitters surface forming and field emitters, no. 20/Z/02 from 20 May 2002). In this paper we describe some calculations concerning emissive parameters i.e. electric field enhancement factor b; emission area a; radius of the emitting sites and their quantity. These calculations seem to confirm the previously stated conclusions that the crystalline forms arising from the material melted with laser beam are the main emitting sites. r 2003 Elsevier Science Ltd. All rights reserved. Keywords: Field electron emitters; Laser engraving; Plasma spraying layers 1. Introduction It is believed that field electron emitters [1,2] could be used as electron sources in vacuum electron devices such as flat panel displays, microwave tubes, vacuum gauges, electron micro- scopes, and microelectronic vacuum devices [3–9]. Commercial application of the field emitters in the nearest future depends on a simple method of manufacturing. Charles Spindt’s concept of field emitter array consisting of emitters integrated with the extrac- tion electrode at the micrometer distance was published in 1968 [10]. Since then, after the first enthusiastic results it became obvious that the Spindt type emitters are too difficult for large- scale production. Worldwide investigations are directed at the simplest methods of production and at new materials for emitters. Today some expectations concern the thin and thick film technologies i.e.: lateral (edge) emitting structures [11,12] and carbon origin composite materials (nano-tubes, modified fullerenes, diamond like layers) [13–15]. In this report we present some calculations of the parameters of the field electron cathode prepared with the new method using a well- established technology of the anilox rolls [16]. The method consists of the following process steps: * Plasma spraying of ceramic coating (for exam- ple: Cr 2 O 3 ). * Polishing surface of the coating. * Laser engraving of the pattern composed of cells with defined linear density and depth. * Metal layer evaporation onto the surface (in this case B50nm thick layer of titanium). 0042-207X/03/$-see front matter r 2003 Elsevier Science Ltd. All rights reserved. doi:10.1016/S0042-207X(02)00676-0