Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric Alexander C. Kozen, Marshall A. Schroeder, Kevin D. Osborn, C. J. Lobb, and Gary W. Rubloff Citation: Appl. Phys. Lett. 102, 173501 (2013); doi: 10.1063/1.4801979 View online: http://dx.doi.org/10.1063/1.4801979 View Table of Contents: http://apl.aip.org/resource/1/APPLAB/v102/i17 Published by the AIP Publishing LLC. Additional information on Appl. Phys. Lett. Journal Homepage: http://apl.aip.org/ Journal Information: http://apl.aip.org/about/about_the_journal Top downloads: http://apl.aip.org/features/most_downloaded Information for Authors: http://apl.aip.org/authors Downloaded 17 Sep 2013 to 129.2.108.93. This article is copyrighted as indicated in the abstract. Reuse of AIP content is subject to the terms at: http://apl.aip.org/about/rights_and_permissions