Efficient Photoacids Based upon Triarylamine
Dialkylsulfonium Salts
Wenhui Zhou, Stephen M. Kuebler, Dave Carrig, Joseph W. Perry,* and
Seth R. Marder*
Contribution from the Department of Chemistry, UniVersity of Arizona, Tucson, Arizona 85721
Received May 14, 2001. Revised Manuscript Received October 29, 2001
Abstract: New triarylamine dialkylsulfonium salts that are photosensitive in the near-ultraviolet have been
prepared. The quantum yields of photoacid generation were found to be ∼0.5 and are independent of the
counterion. On the other hand, the efficiencies of the sulfonium salts toward the photopolymerization of
cyclohexene oxide depend on the counterion and the sulfonium substituents. Photopolymerization kinetic
studies demonstrate that these triphenylamine sulfonium salts are highly efficient cationic photoinitiators.
Introduction
Photoacids are used extensively in both positive- and nega-
tive-tone photoresist formulations in the microelectronics in-
dustry.
1
In particular, iodonium and sulfonium salts have found
widespread use as initiators for cationic photopolymerization
of epoxides and vinyl ethers,
2
and for the cleavage of tert-
butoxycarbonyl, t-BOC, esters in chemically amplified resists.
3
Saeva
4
has shown that for arylsulfonium salts, the photofrag-
mentation can be initiated either by direct excitation of a π-σ*
(sulfur-carbon bond) transition or by excitation of a π-π*
transition followed by intramolecular electron transfer to the
σ* orbital of the sulfur-carbon bond. In both cases, subsequent
homolytic cleavage of the sulfur-carbon bond leads to forma-
tion of a cation-radical on the sulfur-containing fragment, and
a neutral radical (Scheme 1, top). These species undergo
secondary reactions, such as radical coupling or H-transfer, to
produce Brønsted acid, which are important in the decomposi-
tion of some sulfonium salts. In the past, this reaction has been
facilitated by stabilizing the radical fragment.
4-7
In contrast,
phenyldimethyl sulfonium salts having a σ* LUMO are not
photoactive toward acid generation. This has been attributed to
the strength of the S-CH
3
bond (or, in other words, the
instability of a methyl radical), which allows radiative and
nonradiative decay pathways to compete effectively with C-S
bond cleavage.
6
Provided that the energy of the excited state is
sufficient enough to populate σ*, it then follows from the
Hammond postulate that both the driving force and rate for bond
homolysis should be strongly affected by the stability of both
the radical cation and the neutral radical. Herein, we explore
the hypothesis that the quantum efficiency of photoacid genera-
tion can also be enhanced by incorporating triarylamine func-
tionalities that stabilize the radical cation intermediate formed
upon homolysis of the carbon-sulfur bond of aryl dialkyl
sulfonium salts (Scheme 1, middle and bottom). Triarylamine
sulfonium salts were selected as the initial targets to test our
hypothesis because (i) triarylamine radical cations are known
to be very stable; (ii) protonated triarylamino groups are
extremely strong acids (Ph
3
N
+
H, pK
a
)-5),
8
thus the presence
of this amine functionality should not inhibit reactions such as
the ring-opening polymerization of epoxides; and (iii) the
conditions used in the preparation of aryl dialkyl sulfonium salts
9
are compatible with those of the triarylamine functional group.
Experimental Section
Absorption spectra were recorded on a Hewlett-Packard model 8453
spectrophotometer. Fluorescence spectra were collected on a Jobin Yvon
Spex Fluorolog-III fluorimeter. Gas chromatography-mass spectrom-
etry spectra were obtained on a Hewlett-Packard model 6890
(1) (a) Roffey, C. Photogeneration of ReactiVe Species for UV Curing;
Wiley: New York, 1997. Fouassier, J.-P. Photoinitiation, Photopolymer-
ization, and Photocuring: Fundamentals and Applications; Hanser/
Gardner: Cincinnati, OH, 1995. (b) Shirai, M.; Tsunooka, M. Prog. Polym.
Sci. 1996, 21, 1. (c) Photopolymerisation and Photoimaging Science and
Technology; Allen, N. S., Ed.; Elsevier: London, 1989.
(2) Crivello, J. V.; Lam, J. H. W. Macromolecules, 1977, 10, 1307. Crivello,
J. V.; Lee, J. J. Polym. Sci. Polym. Chem. Ed. 1989, 27 3951. Crivello, J.
V.; Lam, J. H. W.; Volante, C. N. J. Rad. Curing 1977, 4, 2. Pappas, S. P.;
Pappas, B. C.; Gatechair, L. R.; Jilek, J. H. Polym. Photochem. 1984, 5, 1.
Welsh, K. M.; Dektar, J. L.; Garcia-Garibay, M. A.; Hacker, N. P.; Turro,
N. J. J. Org. Chem. 1992, 57, 4179. Crivello, J. V.; Kong, S. Macromol-
ecules 2000, 33, 825.
(3) Ito, H.; Willson, C. G.; Frechet, J. M. J.; Farrell, M. J.; Eichler, E.
Macromolecules 1983, 16, 510. Ito, H.; Willson, C. G.; Frechet, J. M. J.,
US Patent 4,491,628, 1985.
(4) Saeva, F. D. AdV. Electron-Transfer Chem. 1994, 4, 1.
(5) Saeva, F. D.; Brelin, D. T. J. Org. Chem. 1989, 54, 712.
(6) Saeva, F. D.; Brelin, D. T.; Martic, P. A. J. Am. Chem. Soc. 1989, 111,
1328.
(7) Andrieux, C. P.; Robert, M.; Saeva, F. D.; Save ´ant, J.-M. J. Am. Chem.
Soc. 1994, 116, 7864.
(8) March, J. AdVanced Organic Chemistry, 3rd ed.; John Wiley & Sons Ltd:
New York, 1985; p 225.
(9) Saeva, F. D.; Morgan, B. P. J. Am. Chem. Soc. 1984, 106, 4121.
Scheme 1
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