Hole trap generation in gate dielectric during substrate hole injection This content has been downloaded from IOPscience. Please scroll down to see the full text. Download details: IP Address: 61.178.176.25 This content was downloaded on 28/09/2013 at 10:56 Please note that terms and conditions apply. 2004 Semicond. Sci. Technol. 19 L1 (http://iopscience.iop.org/0268-1242/19/1/L01) View the table of contents for this issue, or go to the journal homepage for more Home Search Collections Journals About Contact us My IOPscience