This content has been downloaded from IOPscience. Please scroll down to see the full text. Download details: IP Address: 197.136.41.6 This content was downloaded on 19/10/2013 at 19:46 Please note that terms and conditions apply. Bulk micromachining of silicon using electron-beam-induced carbonaceous nanomasking View the table of contents for this issue, or go to the journal homepage for more 2006 Nanotechnology 17 5363 (http://iopscience.iop.org/0957-4484/17/21/013) Home Search Collections Journals About Contact us My IOPscience