Mechanical properties and interface toughness of metal filled
nanoporous anodic aluminum oxide coatings on aluminum
J. Zechner
a,
⁎, G. Mohanty
a
, C. Frantz
a
, H. Cebeci
b
, L. Philippe
a
, J. Michler
a
a
EMPA, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland
b
Rero AG, Hauptstrasse 96, 4437 Waldenburg, Switzerland
abstract article info
Available online 21 September 2014
Keywords:
Anodic aluminum oxide
Interface toughness
Mechanical interlocking
Micro-cantilever
Nanoindentation
The mechanical properties and coating/substrate interface toughness of nanoporous anodic aluminum oxide thin
films, both unfilled and metal-filled, are investigated in the current study. A two-step anodization process is used
to grow the porous oxide, which is subsequently filled with Ni. The mechanical properties of the coating are
probed using nanoindentation and the micro-cantilever deflection technique is used to study the interface tough-
ness. The results are discussed and suggestions for improving the interface toughness are made.
© 2014 Elsevier B.V. All rights reserved.
1. Introduction
In the present study, the suitability of nanoporous anodic aluminum
oxide (AAO) as the base layer for metallic coatings on aluminum is in-
vestigated. Due to its unique honeycomb like structure consisting of
regular nanopores that can be filled with different metallic, ceramic or
polymeric materials, AAO has been intensively investigated as an attrac-
tive material for various applications in optics, electronics and magne-
tism in recent years [1]. The nanoporous structure can also be used as
an attractive base layer for coatings on aluminum and its alloys, espe-
cially in cases where the layer adhesion on the substrate is critical for
a successful application. Thus, it could also be used as an alternative to
the zincate-plating process [2], in which a zinc layer is produced by gal-
vanic displacement of aluminum with zincate. This zinc layer prevents
further oxidation of aluminum and serves as substrate for subsequent
metallizations. Although it has been in use for many decades, obtaining
well adhering coatings using the zincate process is still challenging and
leads to high rejection rates in production. Therefore, there is a strong
industrial demand for an alternative process with improved process
control.
The basic idea of this work is to grow an anodic alumina layer with a
regular nanoporous structure, which is afterwards filled with Ni. This
should serve as an industrially relevant example for metallization on
aluminum. The filled porous structure should then act as a mechanical
anchor for the film on the substrate. This strategy is known to have an
advantageous influence on coating adhesion [3]. Therefore, in the cur-
rent study, an AAO layer is grown on a high purity aluminum substrate,
which is subsequently filled with Ni to form a nanocomposite thin film
consisting of an alumina matrix filled with Ni nanowires. The mechani-
cal properties of the coating are probed by nanoindentation and the
toughness of the substrate/coating interface is quantitatively measured
using the micro-cantilever deflection technique [4,5].
2. Experimental
2.1. Coating deposition
For film deposition, 0.5 mm thick Al disks (99.999%) are degreased in
1.25 N NaOH at 60 °C for 5 min, neutralized in 5.55 N HNO
3
, and then
electropolished in HClO
4
:C
2
H
5
OH = 1:3 at 10 °C for 2 min at 20 V. Af-
terwards, a two-step anodization process is applied in order to obtain
well organized nanopore arrays. The first anodization is achieved in
0.3 M H
2
SO
4
at 3 °C for 8 h at 25 V. The obtained oxide layer is subse-
quently dissolved by immersion in 0.4 M H
3
PO
4
+ 0.2 M H
2
CrO
4
at
60 °C for at least 1 h. The second anodization is carried out under the
same conditions as the first one for 1800 s. Directly after that, the anod-
ization potential is exponentially decreased down to 7.5 V through 60
steps of 20 s each, and finally maintained at 7.5 V for 600 s. This last
step allows thinning and homogenizing the barrier oxide layer in
order to facilitate subsequent electrodeposition.
Then, the porous anodic aluminum oxide is filled with Ni by
potentiostatic reverse pulse deposition in 0.73 M H
3
BO
3
containing
0.154 M Ni(NH
2
SO
3
)
2
, 0.7 mM SDS and 10.9 mM saccharine at 45 °C.
The potential waveform consists of a cathodic pulse of 8 ms at -11 V
followed by a short anodic pulse of 2 ms at 7.5 V. This period is repeated
360,000 times. Al disks and chemicals are purchased from Goodfellow
and Sigma-Aldrich respectively. A Julabo refrigerated/heating circulator
Surface & Coatings Technology 260 (2014) 246–250
⁎ Corresponding author.
E-mail address: johannes.zechner@empa.ch (J. Zechner).
http://dx.doi.org/10.1016/j.surfcoat.2014.08.086
0257-8972/© 2014 Elsevier B.V. All rights reserved.
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