Applied Surface Science 302 (2014) 163–168
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Applied Surface Science
jou rn al h om ep age: www.elsevier.com/locate/apsusc
A novel patterning effect during high frequency laser micro-cutting of
hard ceramics for microelectronics applications
Guillaume Savriama
a,b,∗
, Vincent Jarry
b
, Laurent Barreau
b
,
Chantal Boulmer-Leborgne
a
, Nadjib Semmar
a
a
GREMI-UMR 7344, CNRS/Univ-Orléans, 14 rue d’Issoudun, BP 6744, F-45067 Orléans, France
b
STMicroelectronics, 10 rue Thalès de Milet, CS 97155, 37071 Tours Cedex 2, France
a r t i c l e i n f o
Article history:
Received 24 June 2013
Received in revised form 13 February 2014
Accepted 15 February 2014
Available online 24 February 2014
Keywords:
Laser micromachining
Sapphire
Glass
Phase explosion
Microelectronics industry
a b s t r a c t
This paper investigates the laser micro-cutting of wide band gap materials for microelectronics industry
purposes. An ultraviolet (355 nm) diode-pumped solid-state (DPSS) nanosecond laser was used in this
investigation. The laser energy varied from 7 to 140 J/pulse with typical frequencies from 40 to 200 kHz.
The effect of pulse energy and scanning speed on the depth of the cutting street of -Al
2
O
3
and glass was
studied. Typical depths of 200 m were achieved on -Al
2
O
3
for 140 J/pulse, 40 kHz at 13 mm/s. SEM
images showed periodic patterns produced by periodic explosive boiling that can influence the achieved
depth. The shape, size and periodicity of the recast material depended on the feed rate and the laser beam
frequency. This periodic removal mechanism seems to be specific to dielectrics since it was not observed
for semiconductors such as silicon or silicon carbide.
© 2014 Elsevier B.V. All rights reserved.
1. Introduction
For nanosecond lasers, damage usually occurs via conventional
heating in transparent dielectrics [1]. The electrons are located
in the valence band and are separated from the conduction band
by an optical band gap. The photon energy of the present system
was 3.5 eV and was not sufficient to promote an electron from the
valence to the conduction band. It was shown in Ref. [2] that the
-Al
2
O
3
used here contained impurities, defects and inter-band
transitions. This is responsible for non-linear absorption of the inci-
dent light and initiates the transfer of energy to the matter. In such
a case, the ablation mechanism will likely be similar to that of a
metal [3–5]. The main issue is that this ablation regime depends
on the seed electrons and the laser intensity. The impurities absorb
the incident radiation and transfer the heat energy to the lattice by
carrier-phonon coupling. The material is then heated until its melt-
ing point. The surface of the liquid is then vaporized, and the vapour
exerts a recoil pressure which ejects part of the remaining liquid.
The phenomenon of phase explosion or explosive boiling has also
been reported in the literature [6,7]. This mechanism occurs as the
∗
Corresponding author at: GREMI-UMR 7344, CNRS/Univ-Orléans, 14 rue
d’Issoudun, BP 6744, F-45067 Orléans, France. Tel.: +33 247428112.
E-mail addresses: guillaume.savriama@gmail.com, guillaume.savriama@st.com
(G. Savriama).
superheated liquid reaches 0.8–0.9 times the thermodynamic crit-
ical temperature “T
c
” which is around 5335 K for -Al
2
O
3
[8] and
4000 K for CB6 red glass variety [9]. The system is then a mixture
of vapour and superheated liquid droplets (nuclei). On reaching a
certain density, they are ejected explosively. Phase explosion thus
occurs, provided that both thermodynamic (temperature ∼ 0.8–0.9
“T
c
”) and kinetic (sufficient time “
c
” to allow the nuclei to reach a
critical size “dc”) conditions are met. Refs. [10,11] suggested that
a high power density of 10
10
W/cm
2
is required. However, Han
et al. [9], using a lower power density of 10
8
W/cm
2
at 355 nm,
indicated that the high repetition frequency has a role to play for
glass. Stoian et al. [12] also mentioned the effect of multi-shots on
the occurrence of phase explosion for -Al
2
O
3.
A previous paper
[2] revealed that for high overlap ratios, periodic explosive boiling
could occur, leading to an undesirable larger Heat Affected Zone
(HAZ). Reducing the cutting width is critical in the microelectron-
ics industry to increase the gross die (number of chips per wafer),
as this increases the throughput and reduces the production steps
and material consumption. The present study aims at extending
our knowledge of the parameters that influence explosive boiling
in ceramic substrates.
2. Experimental details
The processing source was a DPSS Nd:YAG laser that is part of
an industrial machine built to manage several wafers, and com-
http://dx.doi.org/10.1016/j.apsusc.2014.02.077
0169-4332/© 2014 Elsevier B.V. All rights reserved.