IOP PUBLISHING NANOTECHNOLOGY
Nanotechnology 18 (2007) 235201 (4pp) doi:10.1088/0957-4484/18/23/235201
Current-carrying capacity of double-wall
carbon nanotubes
Sunkyung Moon
1,2
, Woon Song
1
, Nam Kim
1
, Joon Sung Lee
1
,
Pil Sun Na
1
, Soon-Gul Lee
2
, Jongwan Park
3
, Myung-Hwa Jung
4
,
Hyun-Woo Lee
5
, Kicheon Kang
6
, Cheol Jin Lee
7
and Jinhee Kim
1
1
Korea Research Institute of Standards and Science, Daejeon 305-600, Korea
2
Department of Applied Physics, Korea University, Chungnam 339-800, Korea
3
National Nanofab Center, Daejeon 305-806, Korea
4
Quantum Material Research Team, Korea Basic Science Institute, Daejeon 305-333, Korea
5
Department of Physics, Pohang University of Science and Technology, Pohang 790-784,
Korea
6
Department of Physics, Chonnam National University, Gwang-Ju 500-757, Korea
7
School of Electrical Engineering, Korea University, Seoul 136-713, Korea
E-mail: jinhee@kriss.re.kr
Received 26 January 2007, in final form 15 March 2007
Published 8 May 2007
Online at stacks.iop.org/Nano/18/235201
Abstract
We have studied electrical transport characteristics of individual double-wall
carbon nanotubes (DWNT) under high bias voltages. As the bias voltage
applied to the carbon nanotubes increases, the outermost shell of the DWNTs
broke down sequentially, which enabled us to determine the current-carrying
capacity of each shell. The maximum current-carrying capacity per shell was
about 150 μA, which is well above that of any other previous reports.
(Some figures in this article are in colour only in the electronic version)
One of the potential applications of carbon nanotubes (CNTs)
is an interconnect for integrated circuits due to its large current-
carrying capacity, which is larger than that of copper wires
(10
6
A cm
-2
)[1, 2]. A metallic single-wall carbon nanotube
(SWNT) has two modes for electron propagation so that the
low-bias conductance of an ideal SWNT is predicted to be
twice the conductance quantum (2G
0
= 4e
2
/ h )[2]. However,
it was observed that the current through a SWNT became
saturated at high bias voltages and that the conductance was
far less than the theoretically predicted value, 2G
0
[3]. It was
also found that the current-carrying capacity of an individual
SWNT depends on the length of the SWNT [4]. For a
long SWNT whose length is longer than the electron mean
free path, its current saturates in the range of 20–25 μA at
high bias voltages, which was attributed to electron–phonon
scattering [3]. However, the current saturation is not so clear
for a short SWNT whose maximum current can be as high as
70 μA[4]. Extensive studies on I –V characteristics of CNTs
at high electric fields have revealed the role of phonon and
substrate [5–8].
The total current-carrying capacity of an individual
MWNT is, in general, larger than that of a SWNT. The
maximum current per shell, however, is in the range of
10–60 μA and depends on the length and diameter of
each shell [9]. Note that such values are comparable to
the maximum current-carrying capacity of a SWNT. Since
the diameters of the MWNTs used in previous experiments
(∼10 nm) were about 10 times larger than that of SWNTs
(∼1 nm), such experimental results suggest that the diameter
of the CNT is not a key factor to limit current-carrying capacity
of each shell in a MWNT. It is also found that the current
saturation at high bias voltage, a usual behaviour of SWNT,
is not so clear or even absent in the high bias characteristics of
MWNTs [9].
In this paper we report the unusually large current-
carrying capacity of a double-wall carbon nanotube (DWNT).
By using the electrical breakdown method [10], we have
broken down each shell individually and measured the
maximum current of the inner and outer shells. Both shells
of DWNTs were found to be able to carry a current as high as
150 μA. We also propose a method to determine whether each
shell of a DWNT is metallic or semiconducting by analysing
current–voltage characteristics.
High-purity DWNTs, synthesized by a hydrogen-arc
discharge method [11, 12], were used in our experiments. After
the dispersion of DWNTs on a Si wafer, patterns for contact
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