Þ 1 2001 N 3 29 úú{à®wï 2001 Ntúåï(çtHå)É ¨¢Ä-\ Þ 2 ·èåwåw@(Graduate Student, Nagasaki University School of Dentistry) ú{à®wïæ 65 ª æ 9 (2001)819_ 822 `^/©ÞÄtEÊÌ£ÊÌèÞ O Yi 1 « ^ 2, Þ 2 n ² è Æ 2 c NO 1 Î F M 1 v P M 1 1 ·èåwwÈHwuÀ 2 ·èåwwÈâÔwæêuÀ J. Japan Inst. Metals, Vol. 65, No. 9 (2001), pp. 819_ 822 Ý 2001 The Japan Institute of Metals Determination of Peeling Plane of the Fused Porcelain to Titanium Eri Miura 1 , Liu Jie 2, Þ 2 , Ikuya Watanabe 2 , Yasuhiro Tanaka 1 , Takanobu Shiraishi 1 and Kunihiro Hisatsune 1 1 Department of Dental Materials Science, Nagasaki University School of Dentistry, Nagasaki 852_ 8588 2 Department of Fixed Prosthodontics, Nagasaki University School of Dentistry, Nagasaki 852_ 8588 Microstructure observation of peeling plane of the fusing porcelain with titanium was performed by SEM_ EDX. From the results of the bend test, bonding strength of the degassed sample using bonding_ porcelain is higher than that of degassing_ free and bonding_ porcelain_ free sample. From SEM_ EDX observation of the peeling plane, the sample using the bonding_ porcelain shows good reactivity with the porcelain, and many hollows out of the porcelain side were observed. However, chemical composi- tion of peeling plane indicates that peeling plane is formed by mainly titanium. Microstructures of the sample with and without bonding_ porcelain are obviously different, which indicates that the difference of reaction product in interface region. From the result of the cross_ sectional observation of the fused porcelain/titanium interface, it was suggested that the peeling at interface between titanium and porcelain causes at the oxygen_ dissolved titanium and/or titanium oxide phase which diffuses to the por- celain side. (Received April 26, 2001; Accepted July 11, 2001) Keywords: titanium, fused porcelain, interface, peeling plane, cohesive failure 1. ¾ ßNÈ̪ìÅCÌea«ÉDê½ Ti Ì©ÞÄt ¢¥ªÀp»³êÄ¢éD»ÌêûCTi/©ÞÌ£-xÍ ]ÌààÉä×ÄᢱƪâèÆÈÁÄ¢éD»ÝC £-xÉÖµÄÍüP³êÄ¢éªC»Ì£®Í Ü 誩ÁĢȢDTi/©ÞÄtEÊÌ£ÍC©ÞÆ_» ÌEÊCÜ½Í Ti Æ O ÌáÌsè仨ª©çN ±é±Æª¦´³êÄ¢é 1) DêÊIÉCà®/©ÞÌÄt ÞÌ£ÍCÆ¢©Þ¤©½EÊÅN±éÆl¦çêéªC Ti ¤ÌÃWj󯢤ñà è 2) CTi/©ÞÄtEÊÌ £ÌN_Íè©ÅÈ¢DܽCĬÉ`¬³êéEʽ ªC©ÞRÌàÌ©CĬɶ¬³ê½àÌ©C é ¢Í¢É Ti ÉÅnµ½_fÉæéàÌ©às¾Å  éDcç 3) ÍCTi /©ÞÄtEÊ̪ð\dq°÷¾Ï @ðs¢CEÊÉ Ti RwƵÄAt@X_» Ti Æ _fÅn`^Ì¡\¢ª é±Æð©¢¾µ½DÜ ½C©Þ¤ÅÍCáÌ¿Ì Ti _»¨ð`¬µÄ¨èC ¡GÈ\¢ðÆÁĢ鱯ª»¾µ½D»Ì¼ÉàCTi/ ©ÞÌEʽâ£-xÌñªÈ³êÄ¢éª 4_ 6) C¡ GÈEÊ\¢Ì½ßCTi/©ÞÌEÊðè·é±ÆÍÉß Ä¢ïÅ éDµ½ªÁÄC£ÊÌèÉÍCg¬¨æ ÑgD¯èƯÉC_»wª Ti ¤Æ©Þ¤ÌÇ¿çÉ `¬³êéÌ©ð¾ç©É·é±ÆªdvÆÈéD »±Å{¤ÅÍCTi/©ÞÄtÞÌ£ÊÌÏ@¨æÑ g¬ªÍðsÁ½Dܽ Au }[J[ðp¢½fÊÏ@Éæ ÁÄCEʽª Ti Æ©ÞÌÇ¿ç¤É¶¬·é©ð¾ ç©ÉµC£ÊÌèðsÁ½D 2. À ± û @ ¿ Í CP Ti ( JIS TypeII C x 99.5 ÷ ) ð 0.5 mm ~ 5 mm~25mm ÌTCYÉ¢µ½Â¨æÑsÌÌ Ti p©Þ Ät¯¢¥pÌ©Þ(X[p[|[Z TITANCm ^P»)ðp¢½DÈp©Þ(|[Z)ÉÍCå¬ªÆ µÄ·Î(K 2 O E Al 2 O 3 E 6SiO 2 CNA 2 O E Al 2 O 3 E 6SiO 2 )ªêÔ½ - ÜÜêC¢ÅÎp( SiO 2 ) â©y ( Al 2 O 3 E 2SiO 2 E 2H 2 O, 5 mass÷Ⱥ)ªÜÜêé 7,8) DêÊIÉC©ÞÌ¿ÆÈ é{fBE|[ZÍC§¾«CRü«â-xð½¹é