Journal of Modern Physics, 2012, 3, 383-387
doi:10.4236/jmp.2012.35053 Published Online May 2012 (http://www.SciRP.org/journal/jmp)
In-Situ Study of Silicon Single Crystals Conductivity
under Electron Irradiation
Hrant N. Yeritsyan
1*
, Aram A. Sahakyan
1
, Sergey K. Nikoghosyan
1
,
Vachagan V. Harutyunyan
1
, Karen Sh. Ohanyan
1
, Norair E. Grigoryan
1
,
Eleonora A. Hakhverdyan
1
, Aghasi S. Hovhannisyan
1
, Vahan A. Sahakyan
2
,
Kamo A. Movsisyan
2
, Artur V. Hovhannisyan
3
1
A.I. Alikhanyan National Science Laboratory (YerPhI), Yerevan, Armenia
2
Institute of Metrology Republic of Armenia, Yerevan, Armenia
3
State Nuclear Safety Regulatory Committee by the Government of Armenia, Yerevan, Armenia
Email:
*
Grant@yerphi.am
Received February 23, 2012; revised March 12, 2012; accepted March 23, 2012
ABSTRACT
The influence of electron radiation on the properties of semiconducting silicon single crystals (Si)—both n- and p-types
(currently one of the most widely applied material in the electronic technology) was studied under the electron irradia-
tion process in-situ in air (in common conditions). Higher value of electro-conductivity (σ) during the irradiation proc-
ess with respect to after irradiation was observed, which was explained by ionization and capture mechanisms resulting
in the formation of non-equilibrium carriers (hole-electron pairs). The kinetics of radiation defects generation, their
physical nature, temperature stability and relaxation are examined. Structural radiation defects formation: point and
complexes, their influence on the silicon conductivity are considered.
Keywords: Silicon; Radiation Defects (RD); Carrier Concentration; Carrier Mobility; Conductivity
1. Introduction
There are numerous investigations concerning the influ-
ence of irradiations on the properties of solid states (in-
cluding silicon) which are carried out before and after irr-
adiation [for example 1-14]. The works on studying the
properties of solid states directly under the irradiation
process are very scarce [15-20]. However, these works
describe the situation in more adequate conditions and
are important in terms of using silicon devices, for in-
stance in space, nuclear plants, in particle accelerators. In
present study silicon conductivity (the main property for
practical usage) measurements are carried out directly
under the electron irradiation process.
The nature of radiation structural defects depends on
type, energy, dose and intensity of radiation [1,2,4]. The
charged particles interact with atoms in the material by
means of long-distance Coulomnic forces, resulting in
frequent, but weak collisions. The neutral particles trans-
fer large amount of energy to the atomic nucleus and the
constituent atoms undergo infrequent, but energetic col-
lisions. In the first process, the formation of large number
of simple vacancy-interstitial type atoms predominates;
while in the second case large disordered areas (clusters),
consisting of hundreds, thousands of simple defects are
formed. The difference in these mechanisms results in
different properties of the radiated materials, and it is
very difficult to specify common equivalents for radia-
tion by charged particles or for radiation by neutral parti-
cles.
However, it is possible to find common features when
comparing the effect of different charged particles on a
particular material. For example, when modeling some
effects in semiconductors it is reasonable to substitute
protons and α-particles with energy of several МeV—by
electrons with energies of tens MeV. Nevertheless, each
type of radiation-substitution requires its own particular
and detailed analysis, because even when both kinds of
radiation consist of charged particles there is no absolute
equivalence, because of different defect densities in the
tracks of particles with different masses.
In this paper the results of in-situ measurements of
specific conductivity of silicon single crystals (both n-
and p-type) under electron irradiation with energy 8 MeV
in air (in common conditions) are presented.
2. Experimental Procedure
Both p- and n-types of silicon samples with initial electro *
Corresponding author.
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