International Journal of Current Engineering and Technology E-ISSN 2277 – 4106, P-ISSN 2347 – 5161
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Research Article
910| International Journal of Current Engineering and Technology, Vol.5, No.2 (April 2015)
Structural Morphology and Electrical Properties of Vacuum
Evaporated SnS Thin Films
Bushra A.Hasan
†
and Eman M. Nasir
†*
†
University of Baghdad, College of science, Physics Department, Baghdad, Iraq
Accepted 22 March 2015, Available online 29 March 2015, Vol.5, No.2 (April 2015)
Abstract
Using thermal evaporation technique tin Sulphide (SnS) thin films have been deposited on glass slides have been
deposited at room temperature using SnS powder. The deposited films have been investigated through X- ray
diffraction measurements to determine structural properties. The deposited SnS films found polycrystalline with an
orthorhombic structure. The grain size found to increase with thickness. The surface morphology of the films has been
examined using atomic force microscopy AFM. The chemical compositions of the films have been determined using
energy dispersive analysis of x-rays (EDAX). The dielectric properties of SnS thin films deposited with different
thickness ȋͷͶͶ,ͶͶ,and ͶͶnmȌ are presented in this work. The dielectric permittivity ε and ac conductivity σ ac were
measured at temperatures in the range of 293–493 K and frequencies in the range of 10 kHz–100MHz. It is found that
there are two conductivity mechanisms and hence two activation energies converts to one mechanism with the
increase of thickness. The ac activation energy EAC decreases with increase of thickness and frequency. The exponent s
shows a progressive decrease with thickness. The results are explained in terms of structural difference by the effect
of thickness and thermal treatment. Few anomalies in dielectric studies were observed near 340 and440K,
respectively. These points were related to crystalline phase transitions. Dark-conductivity and photo-conductivity
increases with increase of thickness.
Keywords: SnS semiconductor, XRD, dielectric properties, photoconductivity
1. Introduction
1
Tin sulfide (SnS) is an IV-VI binary semiconductor
compound whose constituent elements Tin (Sn) and
Sulfur (S) are abundant in nature. SnS in its
orthorhombic crystalline structure has direct and
indirect band gap values between 1.3–1.5 eV and 1.0–
1.1 eV, respectively and has p-type conductivity. It has
higher absorption coefficient (~10
5
cm
−1
) compare to
other materials like GaAs and CdTe. These properties
make it a better alternative absorber material for
photovoltaic applications (J. B. Li et al, 2012; P. P. Choi
et al, 2012; J. J. Scragg et al, 2012; L. Grenet et al,2012).
SnS thin films have been deposited by different
techniques such as: the vacuum evaporation of the SnS
compound (L. Price et al, 1999), two stage process (K.T.
Ramakrishna et al,2002) and electrochemical
deposition (Y. Yamazaki et al, 2003). In this work, thin
films of SnS have been grown by thermal evaporation
of the prepared bulk material. A description of the
methods used for the growth of the SnS films and
details of the effect of the deposition parameters on the
a.c conductivity properties as well as on the phase and
crystalline structure in which the samples grow, will be
*Corresponding author: Eman M. Nasir
reported. Moreover, we present the activation energy
value from the temperature-dependent conductivity
measurement. An analysis of the published data
indicates that little is known about the a.c conductivity
of SnS thin films. Because of this reason, an attempt has
been made to deposit SnS thin films with different
thicknesses at room temperature in the present work.
SnS that have been carried out till date, the
experimental results on dielectric study are very few,
and that too are very less informative. It is well known
that dielectric properties of every solid are very
sensitive to the local electric field distribution in the
sample. Therefore, the temperature and frequency
dependence of dielectric constant and loss can explore
useful information about structure changes, transport
mechanism and defect behavior.
2. Experimental Description
Source material, SnS was prepared by melting high
purity elements (99.99%) Sn and S in an evacuated
quartz tube at a temperature of 1173 K. Tin sulfide
films with different thicknesses (100,200,and
300nm)were deposited on corning 7059 microscopic
glass substrate by thermal evaporation technique
under high vacuum (10
-5
Torr) at room temperature.