Effective Decomposition Algorithm for Self-Aligned Double Patterning Lithography Hongbo Zhang 1 , Yuelin Du 1 , Martin D.F. Wong 1 , Rasit Topaloglu 2 and Will Conley 3 1 Dept. of ECE, University of Illinois at Urbana-Champaign 2 GlobalFoundries Corporation 3 Freescale Semiconductor Corporation