Energy Capability of LDMOS as a Function of Ambient Temperature Adarsh Basavalingappa*, Anumeha, Gene Sheu Department of Computer Science and Information Engineering, Asia University, 500, Lioufeng Rd., Wufeng, Taichung 41354, Taiwan E-mail: adarsh.b88@gmail.com* Abstract—Energy capability of a LDMOS device structure is shown to have nonlinear relationship with ambient temperature. Analytical model for energy capability has been discussed and is in good agreement with the simulation results. The dependency of critical temperature on ambient temperature is shown. Keywords-laterally diffused MOS(LDMOS); critical temperature; thermal failure; energy capability; ambient temperature; SOA; TCAD simulation I. INTRODUCTION LDMOS has become the most important member of power semiconductor devices because of its robustness, power capability, cost, reliability, high voltage, high frequency applications, and also because of its superior performance with respect to linearity and efficiency. However device heating under transistor operation results in performance degradation or even thermal runaway. Hence understanding the thermal effects, which is one of the principle failure mechanisms, is very important for designing and optimizing the device to have high energy handling capability. Safe operating area is a fundamental limiting property of the LDMOS devices as claimed by work of Hower et al. [1], [2]. It was shown by [3] that these devices will be affected by electro-thermal instabilities as both electrical and thermal effects are coupled in nature unlike the claims of [4] where the device will be affected by electrical or thermal instability. Localized heat source concept is considered and analytical model for thermal breakdown has been developed in the past [5]. The major complexity in this method is the strong temperature dependence of the material parameters thermal conductivity (K) and thermal diffusivity (D). Using the appropriate effective values of K and D is very important [6]. Previous works of Hagino et al. [7] and Khemka et al. [8] have assumed constant values for K and D for all the ambient temperature conditions and have concluded that energy capability has a linear dependency over ambient temperature. In this paper the LDMOS energy capability has been studied making use of TCAD software Sentaurus [9] and we see nonlinear relationship between energy capability and ambient temperature. The calculated energy capability values from the proposed analytical model are in good agreement with the simulation results. II. ANALYTICAL MODELING An analytical heat flow model is necessary for calculating both electrical and thermal safe operating area. We follow the Green function approach of Dwyer et al. [5].A thin rectangle of dimension a x b on a semi- infinite silicon surface at z=0 is assumed to represent the heat source. A three-dimensional view of the heat flow region is shown in Fig. 1. Thermal failure of a semi- infinite piece of semiconductor subjected to a rectangular power pulse is assumed to occur when the critical temperature is reached, where the excess carrier generated due to thermal effects exceeds the majority carrier concentration. For a surface heat source of lateral dimensions a x b in a semi-infinite medium (ab), power to failure depends on the time scale with respect to the characteristic diffusion times ta, tb associated to these dimensions, where these times represent the time required for the thermal gradient to reach equillibrium in the dimesions a and b respectively [5] and are given by following formulae  and   (1) Where D is the thermal diffusivity (cm 2 /s). Since b  a, the device reaches complete thermal equilibrium after a time of approximately t a . The energy capability of the device E can be calculated in Joules by using the equation                 (2) where Po is magnitude of the constant pulse power (W), t is the period (s), T C is the critical temperature (K), T O 978-1-4673-0192-3/12/$31.00 ©2012 IEEE 65