Preparation of Atomically Smooth Germanium Substrates
for Infrared Spectroscopic and Scanning Probe
Microscopic Characterization of Organic Monolayers
Brian W. Gregory,
†,§
Sajan Thomas,
†
Susan M. Stephens,
†
Richard A. Dluhy,
†
and Lawrence A. Bottomley*
,‡
Department of Chemistry, University of Georgia, Athens, Georgia 30602-2556, and School of
Chemistry & Biochemistry, Georgia Institute of Technology, Atlanta, Georgia 30332-0400
Received March 17, 1997. In Final Form: July 23, 1997
X
The suitability of antimony-doped germanium crystals for use as infrared attenuated total reflection
wave guides and conducting substrates for scanning tunneling microscopic imaging of absorbed organic
monolayers has been evaluated. We have used repetitive ion bombardment followed by resistive heating
of a germanium crystal under ultrahigh vacuum conditions to produce large, atomically flat regions on
a Ge(111) crystal face. Through the combined use of STM, Auger spectroscopy and low-energy electron
diffraction, we have demonstrated that monolayer quantities of tellurium electrochemically deposited onto
the Ge surface dramatically reduce the rate of surface oxidation and permit the use of germanium crystals
as STM substrates in air. The first STM images acquired in air with Ge as the conductive substrate are
reported. No degradation of IR spectral quality occurs when using the Te-covered, Sb-doped Ge crystals
as ATR elements. These findings suggest that Te-coated, atomically flat, low-resistivity Ge substrates are
suitable for both IR spectroscopic and STM imaging of organic monomolecular films.
Introduction
Crystalline germanium is a semiconductor material
with the crystal structure of diamond and a lower melting
point and smaller bandgap (by 0.47 eV) than silicon. The
structural and electronic properties of germanium and
silicon surfaces are of interest due to the importance of
these materials in the semiconductor and optoelectronics
industries.
1
The surface structures for the low-index
planes of Ge single crystals have been thoroughly inves-
tigated.
2,3
The three-fold symmetric Ge(111) surface
undergoes reconstruction to the (2 × 1) surface structure
upon cleavage at room temperature and to the c(2 × 8)
surface structure upon annealing at 100 °C. Surface
reconstructions result in decreased surface free energy
and reactivity.
In addition to its optoelectronics applications, germa-
nium is widely used in spectroscopic applications. High-
purity, optical quality germanium is readily available and
has enabled Ge to be widely used as an attenuated total
reflectance (ATR) crystal material in infrared (IR) spec-
troscopy. In particular, Ge has been extensively used as
a substrate for IR studies of monomolecular films.
4-8
The focus of our current research is the characterization
of organized, two-dimensional monomolecular structures
at interfaces in their native aqueous environment.
4-13
Our
immediate aim is the development of an integrated
approach permitting infrared spectroscopic measurements
and scanned probe imaging to be performed on the same
monomolecular film bound to a single substrate. Vibra-
tional spectroscopy is a powerful tool for the study of
ultrathin organic structures at interfaces; however, the
information obtained is of a macroscopic, surface-averaged
nature. Scanning probe microscopies (i.e., STM and AFM)
are powerful methods for imaging the morphology and
topology of surfaces at atomic resolution and provide
information on the real space, two-dimensional structure
of monolayer surfaces. Thus, the potential advantage in
combining these two powerful methods for studying
ultrathin films provides a strong incentive to find a
common substrate.
A necessary requirement for combining the IR/STM
techniques is the selection of a substrate that is both IR
transparent and electrically conductive. We propose using
germanium for this purpose. The problems associated
with using normal, optical quality, ATR-type germanium
crystals for combined IR/ATR applications are 3-fold: (1)
high purity, optical quality germanium crystals are
typically highly resistive (∼50 Ω cm), rendering them
unsuitable as a conducting substrate for many STM
applications. Doping germanium with extra (extrinsic)
charge carriers is a common method of enhancing its
conductivity. (2) Germanium used for infrared spectro-
* Author to whom correspondence should be addressed.
§
Present address: Department of Chemistry, Illinois State
University, Normal, IL 61790-4160.
†
University of Georgia.
‡
Georgia Institute of Technology.
X
Abstract published in Advance ACS Abstracts, September 15,
1997.
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6146 Langmuir 1997, 13, 6146-6150
S0743-7463(97)00287-4 CCC: $14.00 © 1997 American Chemical Society