Thermal degradation behavior of the compound containing phosphaphenanthrene and phosphazene groups and its ame retardant mechanism on epoxy resin Lijun Qian * , Longjian Ye, Yong Qiu, Shuren Qu Department of Materials Science & Engineering, Beijing Technology and Business University, Beijing 100048, PR China article info Article history: Received 3 August 2011 Received in revised form 6 September 2011 Accepted 29 September 2011 Available online 6 October 2011 Keywords: Flame retardant Structure-effect DOPO abstract The ame retardant epoxy resin has been prepared by mixing the ame retardant additive hexa- (phosphaphenanthrene-hydroxyl-methyl-phenoxyl)-cyclotriphosphazene (HAP-DOPO) into diglycidyl ether of bisphenol-A (DGEBA). After cured by 4,4 0 -Diamino-diphenyl sulfone (DDS), the ame retardant properties of thermosets were characterized by the limited oxygen index (LOI), UL-94 test and cone calorimeter. The results show the lower peak of heat release rate (pk-HRR), the higher ammability rating than that of ame retardant epoxy resin by 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10- oxide (DOPO), hexa-phenoxyl-cyclotriphosphazene (HPCP) and their mixture cloning the ratio of group component of HAP-DOPO. The degradation route of HAP-DOPO was disclosed by thermogravi- metric analysis (TGA), the real time Fourier transform infrared spectra (FTIR), thermogravimetric anal- ysis/infrared spectrometry (TGA-FTIR), pyrolysis gas chromatography mass/spectrometry (Py-GC/MS). During combustion, HAP-DOPO continues to release the PO radicals and o-phenylphenoxyl radical during two degradation stages from 200 C for its unstable trisubstituted methyl structure of HAP-DOPO, inhibits the chain reaction of decomposition and exerts the ame retardant effect in gas phase. The phosphazene groups link with the residual phosphate from degraded phosphaphenanthrene, which increases the crosslink density of residue, effectively promotes the formation of high-strength, high-yield and phosphorus-rich char layer. The structure of HAP-DOPO shows a remarkable ame retardant molecular structure-effect on enhancing the ame retardant efciency on thermosets. Ó 2011 Elsevier Ltd. All rights reserved. 1. Introduction Epoxy resins have been widely used as matrix resin for struc- tural compositions and electronic parts due to its ease of handling and processability, low shrinkage on cure, superior electrical and mechanical properties, and remarkable adhesion to many substrates [1e5]. However, the matrix resin is difcult to meet those high heat resistance and ame retardant elds and applica- tions. Many methods have been developed to improve its thermal stability and ame retardancy [6e10]. In recent years, 9,10-dihydro-9-oxa-10-phosphaphenanthrene- 10-oxide (DOPO) and its derivatives have received outstanding attention because of their high reactivity and applicability on epoxy resin [8]. The works reported for halogen-free ame retardant epoxy resins based on DOPO mainly include the multi-ame- retardant-group epoxy resins [11e 14], the novel structure epoxy resins [15,16], the high T g epoxy resin [17,18], epoxy resin compo- sition [19,20] and DOPO-modied curing agents [2,21,22]. Although a lot of researches have been carried out, some considerable question still need to be explored, such as how to increase ame retardant efciency of the functional groups and that what kind of molecular structure of ame materials can contribute more to the ame retardant efciency of materials. Therefore, it is necessary to explore the degradation route and the pyrolysis behavior of ame retardant materials [23,24]. Fortunately, a few works has been reported about the pyrolysis mechanism of DOPO-containing polymers [1,12,25,26]. Recently, we attempt to construct the additive molecule with double functional groups for obtaining ame retardant materials with high efciency. We integrated phosphaphenanthrene and cyclotriphosphazene groups into one molecule as ame retardant additive instead of the reactive DOPO, phosphazene compounds and their derivatives in thermosets. It directly leads to a higher T g and perfect ame retardancy of thermosets with a lower addition [14]. However, the molecular degradation and ame retardant mechanisms are still undisclosed in the former research. * Corresponding author. Tel.: þ86 15810812389; fax: þ86 (0)10 68985531. E-mail address: qianbtbu@163.com (L. Qian). Contents lists available at SciVerse ScienceDirect Polymer journal homepage: www.elsevier.com/locate/polymer 0032-3861/$ e see front matter Ó 2011 Elsevier Ltd. All rights reserved. doi:10.1016/j.polymer.2011.09.053 Polymer 52 (2011) 5486e5493