See discussions, stats, and author profiles for this publication at: https://www.researchgate.net/publication/224883046 Stoichiometric limitations of RF plasma deposited amorphous silicon-nitrogen alloys Article in Thin Solid Films · March 1997 DOI: 10.1016/S0040-6090(97)00460-4 CITATIONS 10 READS 18 2 authors, including: Some of the authors of this publication are also working on these related projects: Designer "inorganics-in-organics" for x ray detection View project Graphene Metrology View project S Ravi P Silva University of Surrey 631 PUBLICATIONS 11,401 CITATIONS SEE PROFILE All content following this page was uploaded by S Ravi P Silva on 19 February 2015. The user has requested enhancement of the downloaded file.