See discussions, stats, and author profiles for this publication at: https://www.researchgate.net/publication/228861194 ILT for double exposure lithography with conventional and novel materials - art. no. 65202Q Article in Proceedings of SPIE - The International Society for Optical Engineering · March 2007 DOI: 10.1117/12.712382 CITATIONS 14 READS 23 3 authors: Amyn Poonawala Synopsys 23 PUBLICATIONS 294 CITATIONS SEE PROFILE Yan Borodovsky Intel 6 PUBLICATIONS 90 CITATIONS SEE PROFILE Peyman Milanfar Google Inc. 182 PUBLICATIONS 8,309 CITATIONS SEE PROFILE All content following this page was uploaded by Amyn Poonawala on 03 June 2015. The user has requested enhancement of the downloaded file.