Abstract An important step of the factor analysis method
is the determination of the number of significant factors.
Common techniques as Malinowski indicator function
provide perhaps uncertain results in spectroscopic cases
depending on signal to noise ratio, the overlap of spectra,
sample misalignment and concentration of the factors.
A new method for the determination of the number of
components in Auger depth profiling is established. The
new method of correlation of abstract basic spectra
(CABS) takes into consideration the influence of experi-
mental error especially noise. Simulations were carried
out, to prove the CABS method. The results are compared
with those obtained by established methods. Auger depth
profiles of SiC and Si
3
N
4
-layers on Si(111) were analyzed
by means of the CABS method and Target Factor Analy-
sis. Aspects of data pretreatment as filtering are discussed.
Introduction
Factor analysis has become a common technique to ana-
lyze Auger depth profiles. If more than one chemical state
of an element is supposed within a layer system or if the
chemical bonds are changing via sample depth, factor
analysis is the suitable method for quantification of Auger
depth profiles. The factor analysis produces three impor-
tant results. The first result is the number of significant
chemical states the sample consists of, as a second we get
the spectra of the chemical components and as a third,
factor analysis provides their concentrations.
This paper deals with the estimation of the number of
chemical components in factor analysis of Auger depth
profiles. This important step of factor analysis is com-
monly connected with empirical criteria as the Mali-
nowski indicator function [1]. But in the spectroscopic
case this empirical criterion provides ambiguous results
depending on experimental error as noise and sample mis-
alignment [2]. This fact leads to uncertainties in the esti-
mation of the number of components. By using factor
analysis programs the user has to estimate the number of
components by comparing different empirical criteria, but
finally the decision is a manual operation. To improve this
unsatisfactory state in electron spectroscopy some graphi-
cal methods of estimation of sample components were es-
tablished [3, 4]. This paper puts forward a new method of
the estimation of sample components, which oppresses
the influence of experimental noise. The influence of
sample misalignment is not discussed here, but it can be
omitted by measuring the same spectrum under the same
experimental conditions several times [2].
Experimental
Measurements were carried out with Auger spectrometer ASC
2000 (Riber). The Auger depth profiles were acquired at 3 keV
primary electron energy, 1 μA current, 0 ... 22.5° incidence angle.
The properties of the cylindrical mirror analyzer were 0.3% energy
resolution, modulation 0.95V
eff
at frequency of 14 kHz. An Ar
+
sputter beam of an energy of 1 keV, 60° ... 80° incidence angle and
10 ... 32 μA/cm
2
current density was used. The spectra (Si LVV
peak) were recorded in the kinetic energy range of 70 to100 eV
with 0.5 eV energy steps. The noise was recorded in the energy
range of 150 to 180 eV with 0.5 eV energy steps, too.
A sample of Si
3
N
4
on Si(111) was prepared with a layer thick-
ness of 95 nm. Furthermore a 30 nm SiC layer on Si (111) was de-
posited by solid source molecular beam epitaxy at 680 °C growth
temperature.
Ralf Pieterwas · Gernot Ecke · Rastislav Kosiba ·
Hans Rößler
A new method of the determination of significant factors
with factor analysis in AES
Fresenius J Anal Chem (2000) 368 : 326–334 © Springer-Verlag 2000
Received: 20 January 2000 / Revised: 5 April 2000 / Accepted: 16 April 2000
ORIGINAL PAPER
R. Pieterwas · G. Ecke () · R. Kosiba · H. Rößler
TU Ilmenau, Institut für Festkörperelektronik, Postfach 100565,
D-98684 Ilmenau, Germany
R. Kosiba
STU Bratislava,
Faculty of Electrical Engineering and Information Technology,
Department of Microelectronics,
Ilkova 3, 81219 Bratislava, Slovakia
R. Pieterwas
IGH Automation GmbH, Bahnhofstr. 35,
40467 Langenfeld, Germany