ISSN (Print): 2328-3491, ISSN (Online): 2328-3580, ISSN (CD-ROM): 2328-3629 American International Journal of Research in Science, Technology, Engineering & Mathematics AIJRSTEM 17-410; © 2017, AIJRSTEM All Rights Reserved Page 37 Available online at http://www.iasir.net AIJRSTEM is a refereed, indexed, peer-reviewed, multidisciplinary and open access journal published by International Association of Scientific Innovation and Research (IASIR), USA (An Association Unifying the Sciences, Engineering, and Applied Research) ELECTRICAL AND OPTICAL PROPERTIES OF THIN FILM OF MAGNESIUM FLUORIDE WITH OTHER LAYERS Mukesh Upadhyay*, Pankaj Singh *Department of Physics North Eastern Regional Institute of Science & Technology Nirjuli, Itanagar, Arunachal Pradesh – 791109 [India] I. Introduction A thin film is a layer of material ranging from fractions of nanometre (monolayer) to several micrometre thicknesses. The controlled synthesis of materials as thin films (a process referred to as deposition) is a fundamental step in many applications. A familiar example is the household mirror, which typically has a thin film coating on the back of a sheet glass to form a reflective interface. Advances in thin film deposition techniques during the 20 th century have enabled a wide range of technological breakthrough in areas such as magnetic recording media, electronic semiconductor devices, LEDs, optical coating (such as antireflective coatings) hard coating on cutting tools and for both energy generation (e.g. thin film solar cell) and storage (thin film batteries) It is also being applied to pharmaceuticals, via thin-film drug delivery. The range of materials deposited vary from semiconductor metals or alloys for contacts and insulator for passivation and interlayer separation. Recently the growing interest in nano-particles and Nano-crystalline films with various techniques has been adapted for preparation or deposition of nano-particles. In addition to their applied interest thin films play an important role in the development and study of materials with new and unique properties example multi-ferroic materials and supper lattices that allow the study of quantum confinement by creating two dimensional electron states. There are several techniques available for thin films deposition on a single crystal substrate like thermal evaporation, chemical decomposition, and the evaporation of source materials by the irradiation of energetic species or photons [3,4]. In general the growth process of thin films exhibits the following features 1) Thin films of all materials created by any deposition technique starts with a random nucleation process followed by nucleation and growth stages 2) Nucleation and growth stages are dependent upon various deposition conditions, such as growth temperature, growth rate, the chemistry of the material and the substrate and their structure. 3) The nucleation stage can be modified significantly by external agencies, such as electron or ion bombardment 4) Film microstructure, associated defect structure, and film stress depend on the deposition conditions at the nucleation stage 5) The crystal phase and the orientation of the films are governed by the deposition conditions as well as by the structure of the substrate II. Theory The data for the refractive index for various layers of thin films of magnesium fluoride (MgF2) along with the mixture of other layers like the mixture of zirconium oxide (ZrO2) and titanium oxide (TiO2), a magnesium oxide layer (MgO) are obtained by Radhika V et al.[5], which is used to find the various other electrical and optical properties using different physical relations, which are tabulated below Abstract: Dielectric, anti-reflective, or high reflective multilayer system consists of alternating dielectric layers of low and high refractive index. In the present work, a detailed study of various techniques for the preparation of thin films has been presented along with the various methods for characterizing these thin films [1,2]. The various modes of growth of thin films and a number of factors affecting the growth structure and film properties have been studied. A theoretical study of the electrical properties like relative dielectric constant and some optical properties like reflectance and transmittance of thin films of MgF2 and other mixture of layers, using some mathematical tools has been investigated theoretically which may be experimentally verified. Key words: Antireflective, Reflectance and Transmittance