Effect of thickness on optical and microwave dielectric properties
of Hydroxyapatite films deposited by RF magnetron sputtering
Apurba Das
a
, Anil Kumar Chikkala
a
, Gyan Prakash Bharti
a
, Rasmi Ranjan Behera
b
,
Ravi Sankar Mamilla
b
, Alika Khare
a
, Pamu Dobbidi
a, *
a
Department of Physics, Indian Institute of Technology Guwahati, Guwahati, 781039, India
b
Department of Mechanical Engineering, Indian Institute of Technology Guwahati, Guwahati, 781039, India
article info
Article history:
Received 22 August 2017
Received in revised form
18 December 2017
Accepted 24 December 2017
Available online 29 December 2017
Keywords:
HAp films
RF sputtering
XRD
Nonlinear optical properties
Dielectric properties
abstract
This study present findings on the structural, optical and dielectric properties of polycrystalline
Hydroxyapatite [HAp, Ca
10
(PO
4
)
6
(OH)
2
] films, deposited using radio-frequency (RF) magnetron sputter-
ing. The X ray diffraction (XRD) studies revealed that the unit cell volume and crystallite size of the films
deposited on quartz substrates enhanced with an increase in film thickness. The Young's modulus (E
hkl
)
and the Poisson ratio (n
hkl
) of the thin films along different crystallographic directions have been
calculated using the X-ray elastic constants. The Young's modulus of the films exhibited crystallographic
direction dependence which suggests that the sputtered films are anisotropic. The dielectric constant ε
r
and the loss tangent tand of the sputtered films were in the range 29e85 and 0.0028e0.0014 respectively
at a frequency of 1 MHz. These values are by far the best for films deposited under a pure argon envi-
ronment. The improvement in crystallinity and uniform grain size of the films are used as parameters to
understand the variation in dielectric properties of the sputtered films. The best microwave dielectric
properties were in the range ε
r
¼ 75 - 65 and tand ¼ 0.014e0.032 when measured at 5 and 10 GHz,
employing split post dielectric resonator (SPDR) technique. The obtained results suggest that HAp
sputtered films can be promising for optical limiting and applications in tunable microwave devices.
© 2017 Elsevier B.V. All rights reserved.
1. Introduction
Hydroxyapatite (HAp) is a widely known bioactive ceramic that
mimics the chemical composition of bones and teeth [1e5]. Bone is
composed of organic and inorganic constituents. The inorganic
component of natural bone is constituted of biological apatites
along with trace elements like sodium, magnesium, strontium etc.
which are known to supply strength to the skeleton. These
biological apatites shows structural similarity with mineral apatites
such as HAp [Ca
10
(PO
4
)
6
(OH)
2
] and Brushite [CaHPO
4
$2H
2
O].
Crystallographic studies on HAp have revealed that it has a complex
crystal structure with 44 atoms arranged in a hexagonal primitive
cell and crystallizing in a space group of P6
3
/m [6e8]. The OH
groups are found to be aligned in columns parallel to the c-axis,
along with Ca
2þ
and (PO
4
3
) ions [9e12].
Owing to the excellent bioactivity and biocompatibility both
in vivo and in vitro, Hydroxyapatite has been widely used as a
feasible bone substitute material [13e16]. Initial research on HAp
focussed mainly on developing the biocompatibility and mechan-
ical properties of HAp for load bearing applications [14e19]. The
current research trend in HAp has been in studying the electrical
properties which has proven to be phenomenal in supplementing
the bioactivity studies [19e26].
Commercially, the most utilized method to deposit HAp is
plasma spraying. This technique has a very high deposition rate and
the films deposited are reported to show good bioactivity [27]. But
despite a lot of clinical success, because of certain issues like poor
long time adherence of the coating to substrates, tendency to
resorb and non-uniformity of the deposited layer, researchers have
focussed on developing other novel techniques to obtain HAp
coatings which will eliminate the shortcomings of the method
previously described.
It is not hard to appreciate the role of sputtering in the growth of
uniform thin films over all types of substrates be it metallic, ceramic
or polymer. Sputtering usually generates films which are either
amorphous or polycrystalline with precise control over deposition
* Corresponding author.
E-mail address: pamu@iitg.ernet.in (P. Dobbidi).
Contents lists available at ScienceDirect
Journal of Alloys and Compounds
journal homepage: http://www.elsevier.com/locate/jalcom
https://doi.org/10.1016/j.jallcom.2017.12.293
0925-8388/© 2017 Elsevier B.V. All rights reserved.
Journal of Alloys and Compounds 739 (2018) 729e736