Prototype of a Mirror bender for Siam Photon Laboratory A.OONSIVILAI 1 , A. SUTHUMMAPIWAT 2 , P. SONGSIRITTHIGUL 3 , B. MARUNGSRI 4 , and T. KULWORAWANICHPONG 5 1 Alternative and Sustainable Energy, Smart Materials and Intelligent System Research Unit, 4,5 School of Electrical Engineering, Institute of Engineering, Suranaree University of Technology 2, 3 School of Mechatronics Engineering, Institute of Engineering, Suranaree University of Technology 111 University Street, Muang District, Nakhon Ratchasima, 30000 THAILAND Corresponding author: 1 anant@sut.ac.th , http://www.sut.ac.th Abstract: This paper presents a design study of adjustable mirror bender system. This system is functioned to adjust beam size focusing on sample in synchrotron light beamline (BL3) at synchrotron light research institute, Thailand. The design utilizes COSMOS program to help in finite element method for simulating the relation of radius value of mirror in function of various action force applying on curvature mirror. Al Alloy(6061) and Zerodur size 40mm x 300mm x 15mm are used as study mirror. All of structures of mirror bender system are built by stainless steel. The simulation of system is to apply a forces to adjust the mirror radius in 50,000 – 60,000 mm range for using it in real circumstance in beamline system. The results of study show the forces in 100-150 N range for Al Alloy (6061) and 150-200 N range for Zerodur giving proper curvature radius values. In contrast, the apply force is more than 300 N calculating from 80% of stress value of mirror, that damages the system. Finally, a prototype of the system is designed and built by using Al Alloy(6061) as a bender mirror. The testing results of the prototype show that apply forces just in range of 50- 100 N are suitable enough for the system. That means the apply force of the prototype is 50 N less than the simulation. Therefore, this mirror bender system is ready and suitable for installation in synchrotron light beamline. Key-Words: synchrotron light beamline, mirror bender, Zerodur, COSMOS 1 Introduction Presently, science technology is developed and far more advance. Many applications are used high performance and technology to test and investigate. One of high performance and technology is synchrotron light machine. Synchrotron light is the electromagnetic radiation emitted when electrons, moving at velocities close to the speed of light, are forced to change direction under the action of a magnetic field. The synchrotron light is unique in its intensity and brilliance and it can be generated across the range of the electromagnetic spectrum: from infrared to x-rays. Applications of synchrotron light are used in many aspects such as physical science, biological physic and so forth. The synchrotron light machine is composed of many important parts and one of the important parts is beamline system. This system comprises many parts such as vacuum tube, vacuum chamber and especially, optical equipments. The optical equipments are mirror grating and crystal etc. functioning to select wavelength, size and focusing of beam light that point at study sample. One of the important techniques in synchrotron applications is X-PEEM (X-ray Photoemission Electron Microscopy) applying in nano-structure spectroscopy and even in taking photo in micro- nano scale. The principle of X-PEEM is to use suitable soft X-rays or vacuum ultraviolet range to excite electron in atom of sample emitted from sample for studying its photoelectron. Photoelectron energy depends on energy levels of atom, type of atom and wavelength of exciting x- rays. Photoelectrons having diameters about 2-100 microns are emitted collected and amplified by equipments that similar to use in SEM (scanning electron microscopy). Amplified electron is brought to image on screen as shown in figure 1 that able to measure in chemical analysis of minute area (<100 nanometer) . Intensity or contrast of picture that images on screen is the characteristics of surface, type of atom, work function of material WSEAS TRANSACTIONS on SYSTEMS A. Oonsivilai, A. Suthummapiwat, P. Songsiritthigul, B. Marungsri, T. Kulworawanichpong ISSN: 1109-2777 549 Issue 5, Volume 9, May 2010