Tel. +32/9.264.43.82; Fax. +32/9.264.49.96; e-mail: Ilse.DeRoeck@rug.ac.be Reference number poster: H3.3-02 Rotatable magnetron sputtering of YBa 2 Cu 3 O 7-x thin films on single crystal substrates I. De Roeck a , G. De Winter a , R. Van Paemel a , R. De Gryse a , J. Denul b , I. Van Driessche c , E. Bruneel c , S. Hoste c , E. Georgiopoulos d , C. Andreouli e , A. Tsetsekou f a Ghent University, Department of Solid State Sciences, Krijgslaan 281/S1, 9000 Gent, Belgium; b Bekaert, Bekaertweg 2/6030, 8550 Zwevegem; c Ghent University, Dep. Of Inorg. And Phys. Chemistry, Krijgslaan 281/S3, 9000 Gent, Belgium; d Dept. of Mineral Resources Engineering, Technical Univ. Crete, University Campus, 73100 Chania, Greece; e CERECO S.A., 72 nd km of Athens-Lamia Ntl Road, P.O.Box 146, 34100 Chalkida, Greece; f National Techn. Univ. of Athens, Dept. of Mining Engineering and Metallurgy, Iroon Polytechniou 9, 157 80, Athens, Greece. Abstract - The development of sputter deposition of YBa 2 Cu 3 O 7-x (YBCO) from rotatable targets is an important step in the realisation of a large scale deposition process for YBCO coated conductor. Rotatable magnetron sputter sources are standard equipment in large scale sputter industry and the power input in a rotatable magnetron can be much higher compared to a planar magnetron with the same race track area. This results in improved discharge characteristics and increased deposition speed. For this work a flame sprayed and a plasma sprayed cylindrical YBCO target was used to deposit YBCO thin films on single crystal MgO. C-axis oriented YBCO thin films were obtained at lower pressure than is normally used for YBCO sputter deposition, resulting in a higher deposition speed. The influence of deposition parameters (such as sputter pressure, oxygen partial pressure, substrate temperature, …) on the properties of the YBCO layer was investigated and the possibilities for large scale deposition were explored. Keywords: large scale, rotatable magnetron, YBCO deposition, single crystal I. Introduction Magnetron sputtering is one of the most easily scalable techniques to develop YBa2Cu 3O7-x (YBCO) coated conductor, since it is used in industrial environments for web coating of meters wide and kilometres long substrate foil. Several problems encountered with sputter deposition of YBCO are related to the fact that the input power and the discharge voltage are too low. The use of a rotatable sputter magnetron with cylindrical YBCO target for the sputter deposition of YBCO has multiple benefits. First of all, the power input can be considerably higher than for a non-moving target with the same racetrack area, because of better heat dissipation. Consequently the deposition speed can be higher and the discharge characteristics are improved. The material usage of the target is also much more efficient in the case of sputtering from a rotatable target. We already demonstrated that