~ Pergamon
Solid State Communications, Vol. 98, No. 5, pp. 457-461, 1996
Copyright © 1996 Elsevier Science Ltd
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0038-1098(95)00802-0
HOPPING TRANSPORT THROUGH AMORPHOUS JUNCTIONS
H. Bahlouli
Physics Department, King Fahd University of Petroleum and Minerals, Dhahran 31261, Saudi Arabia
(Received 20 October 1995; accepted 23 November 1995 by B. Lundqvist)
We study electron tunneling through thin amorphous material and
obtain the relative strength of different hopping channel contributions
to tunneling compared to the elastic resonant contribution under high
magnetic field. The order of magnitude of these contributions are in
good agreement with the recent experimental data on amorphous
silicon tunnel junctions.
Keywords: A. heterojunctions, A. semiconductors, D. tunnelling.
THE SUBJECT of electronic transport via localized
states in tunnel junctions is attracting a lot of interest
both theoretically [1] and experimentally [2]. For very
thin barriers (thickness d less than 60 ,~) we know that
direct tunneling dominates the transport properties of
the junction, when the thickness increases other types
of indirect tunneling processes take over. What seems
to be an interesting feature from the experimental
point of view is that each of these indirect tunneling
processes has a well defined region in terms of thick-
ness, d, and temperature range, T, where it dominates.
For thicknesses greater than 60 ,~ and less than 100,~,
resonant tunneling dominates, above this thickness an
inelastic hopping process starts to take over. First, the
two impurity channel opens up for d>~100,~ and
T ~<15 K, then for d ~>120 A the three impurity chan-
nel becomes effective within the same range of low
temperatures. One expects that when the junction
becomes very thick (d i> 300,~) Mott's variable range
hopping process takes over. The transition from an
inelastic hopping to variable range hopping regime
has been seen experimentally. Thus there are two
regions, in terms of temperature and barrier thickness,
in which tunnel junction conductance is well under-
stood from the theoretical point of view. For high
temperatures and thick barriers, the conduction is well
described by variable range hopping as predicted by
Mott [3] and the conductance varies as:
GVRH(T) = GO exp[-(T*/T)l/4], (1)
where Go is a constant, T* is a parameter which is
related to the density and width of the localized states
in the amorphous material. For low temperatures and
thinner barriers, some forward-directed, one dimen-
sional chain-like hopping dominates the conduction
[4]. It is clear from the experimental point of view that
some cross-over takes place between these two
regimes but no theoretical work gave clear evidence
for this cross-over.
In this work we will study hopping conduction at
intermediate thicknesses where inelastic hopping
dominates the transport. Generally speaking, because
of the small localization length (a = 6.7A in amor-
phous silicon), electron-electron correlation plays an
important role, we expect highly correlated transport
via these localized states as it is seen experimentally.
We shall show that processes of inelastic tunneling in
channels containing two and three impurity states
with a scatter of the energies of the order of KBT
play an important role in low temperature conduction
of intermediate thickness junctions.
Assuming the width of the impurity level, F, to be
small compared to temperatures of interest, we can
use the usual kinetic equation approach to evaluate
the linear conductance of a single chain containing n
impurities joining the metal contacts. In spite of the
fact that such chains are encountered less frequently,
it is they that determine the conduction of junctions of
intermediate thicknesses (d < AVRH, AVRH being the
characteristic length in Mott's variable range hopping
process). Let us order the energies of the n-impurity
levels in the chain so that
~1 < £2 < £ 3 " ' ' < 6n 1 < £n, (2)
where el and en are the closest to the left and right
leads, respectively. In general there are many chains
457