Interface Modification Enabled by Atomic Layer Deposited
Ultra-Thin Titanium Oxide for High-Efficiency and
Semitransparent Organic Solar Cells
Leiping Duan, Borong Sang, Mingrui He, Yu Zhang, Md Anower Hossain,
Md Habibur Rahaman, Qingya Wei, Yingping Zou,* Ashraf Uddin,* and Bram Hoex*
1. Introduction
Featuring lightweight, semitransparency, flexibility, and low
costs, organic solar cells (OSCs) have attracted wide research
interest.
[1–4]
In the recent 2 years, ascribing to significant devel-
opments in new organic materials and device engineering strat-
egies, OSCs are considered to reach its second golden age with
the profoundly improved power conversion efficiency (PCE) and
device stability.
[5–7]
Although the light-
absorbing layer is essential, the charge
transport layer also plays a significant role
in achieving high device performance in
OSCs, as it promotes the charge carrier
transport and protects the active layer from
the air penetration in the device.
[8,9]
Due to
its high electron mobility, high transpar-
ency, and the suitable energy level, zinc
oxide (ZnO) is the most widely used elec-
tron transport layer (ETL) for OSCs.
[10,11]
However, ZnO exhibits high energy radia-
tion instability due to its high photosensi-
tivity caused by the presence of surface
defects.
[12–14]
Consequently, there is a need
for further optimization of the ZnO ETL in
OSCs.
[15–17]
Recently, Zou and co-workers modified
the state-of-the-art acceptor material Y6
and synthesized a novel acceptor material
N3.
[18,19]
We have previously reported a
14% PCE for the N3-based OSCs in an
inverted device structure based on the
ZnO layer.
[20]
The unencapsulated device
showed around 50% of PCE loss after the burn-in degradation
test for 5 h, where the instability of the interface layers and
the electrode was found to be the leading cause. Herein, modi-
fying the ZnO layer can be a feasible method to bring further
performance and stability improvement to this type of device.
An atomic layer deposition (ALD) technique is an intrinsic
self-limiting process with ultimate process control and low sub-
strate temperature, which is an appealing method for depositing
ultrathin metal oxides to modify the interfacial layer.
[21]
To date,
ALD metal oxide for the interface modification is widely demon-
strated in silicon, dye-sensitized, perovskite, and chalcogenide
thin-film solar cells to improve their device performance.
[22–27]
It may also be an effective method to modify the ETL for
OSCs. For instance, Kim et al. used ALD to deposit an additional
ultra-thin ZnO as the ETL in OSCs to enhance the PCE and sta-
bility.
[28]
Vasilopoulou et al. demonstrated the passivation effect
from the ALD deposited alumina (Al
2
O
3
) and zirconia (ZrO
2
)
insulating nanolayers to OSCs and demonstrated a 30% PCE
improvement.
[29]
Polydorou et al. used ultra-thin ALD deposited
alumina (Al
2
O
3
) and zirconia (ZrO
2
) to modify the ZnO ETL in
OSCs and demonstrated a significant improvement in both PCE
and device stability.
[30]
Consequently, the ALD-assisted interface
L. Duan, B. Sang, M. He, Y. Zhang, Dr. M. A. Hossain, M. H. Rahaman,
Prof. A. Uddin, Prof. B. Hoex
School of Photovoltaic and Renewable Energy Engineering
University of New South Wales
Sydney, NSW 2052, Australia
E-mail: a.uddin@unsw.edu.au; b.hoex@unsw.edu.au
Q. Wei, Prof. Y. Zou
College of Chemistry and Chemical Engineering
Central South University
Changsha 410083, P. R. China
E-mail: yingpingzou@csu.edu.cn
The ORCID identification number(s) for the author(s) of this article
can be found under https://doi.org/10.1002/solr.202000497.
DOI: 10.1002/solr.202000497
Organic solar cells (OSCs) are considered to have reached a second golden age
with profoundly improved power conversion efficiency (PCE) and device stability
in recent years. The modification of the interface layer plays a significant role in
achieving performance enhancement in OSCs. Herein, the use of the atomic layer
deposition (ALD) ultrathin TiO
x
to modify the interface layer in OSCs is reported.
The modification with only two TiO
x
ALD cycles not only effectively passivates the
interface between the ZnO electron transport layer (ETL) and the active layer, but
also reduces the series resistance and improves the charge transport process in
the device. An absolute 1% increase in PCE with enhanced device stability for
modified OSCs is achieved. Semitransparent OSCs are also fabricated by
applying this interface modification strategy. The modification with two TiO
x
ALD
cycles increases the electrical device performance without affecting the optical
properties of the semitransparent device. An average PCE of 10.46% with an
average visible transmittance (AVT) of 19.61% and a color rendering index (CRI)
close to 100 is demonstrated for the fabricated semitransparent device with the
modification. The ALD-assisted interface modification provides a straightforward
way to realize high-performance semitransparent OSCs.
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