ARTICLES
PUBLISHED ONLINE: 5 MAY 2013 | DOI: 10.1038/NMAT3626
H
2
evolution at Si-based metal–insulator–
semiconductor photoelectrodes enhanced by
inversion channel charge collection and H spillover
Daniel V. Esposito
1
, Igor Levin
1
, Thomas P. Moffat
1
*
and A. Alec Talin
2,3
*
Photoelectrochemical (PEC) water splitting represents a promising route for renewable production of hydrogen, but trade-offs
between photoelectrode stability and efficiency have greatly limited the performance of PEC devices. In this work, we employ
a metal–insulator–semiconductor (MIS) photoelectrode architecture that allows for stable and efficient water splitting using
narrow bandgap semiconductors. Substantial improvement in the performance of Si-based MIS photocathodes is demonstrated
through a combination of a high-quality thermal SiO
2
layer and the use of bilayer metal catalysts. Scanning probe techniques
were used to simultaneously map the photovoltaic and catalytic properties of the MIS surface and reveal the spillover-assisted
evolution of hydrogen off the SiO
2
surface and lateral photovoltage driven minority carrier transport over distances that
can exceed 2cm. The latter finding is explained by the photo- and electrolyte-induced formation of an inversion channel
immediately beneath the SiO
2
/Si interface. These findings have important implications for further development of MIS
photoelectrodes and offer the possibility of highly efficient PEC water splitting.
H
ydrogen production by solar-driven photoelectrochemical
water splitting is an attractive means to convert intermittent
solar radiation into a storable, non-polluting fuel. However,
the efficiency and stability of semiconducting photoelectrodes used
in PEC devices must be substantially improved to make this process
economical
1–3
. One approach to achieving high solar-to-hydrogen
efficiency and stability is the metal–insulator–semiconductor (MIS)
photoelectrode design
4,5
. As illustrated in Fig. 1a, a typical MIS
photocathode consists of metallic ‘collectors’ situated on the surface
of an insulator-covered semiconductor. When the MIS photocath-
ode is illuminated, minority carriers tunnel through the insulating
layer to the collector, where the hydrogen evolution reaction takes
place. An advantage of the MIS design is that semiconductor
stability and light-harvesting efficiency are decoupled, enabling
narrow bandgap semiconductors that are well-suited for absorbing
sunlight to be used without being corroded by the electrolyte.
A critical role is played by the thin insulating layer, typically
an oxide, which must simultaneously protect the semiconductor
from the corrosive electrolyte and efficiently mediate minority
carrier transport across the MIS junction with minimal recombi-
nation. According to the conventional view of MIS photocathode
operation (Fig. 1a), photocurrent may only be produced when
photogenerated electrons are created within a distance less than
the sum of the depletion width (W ) and effective minority carrier
diffusion length (L
e
) of a collector. In a well-behaved p-type MIS
junction, photogenerated minority electrons pass directly from the
semiconductor conduction band edge (E
C
) to the Fermi level of the
metallic collector (E
f,metal
), as illustrated in Fig. 1b.
Both elemental and compound semiconductors have been
explored for water splitting in the MIS device geometry
4–10
.
Appreciable conversion efficiencies have been demonstrated for
InP photoelectrodes
7,8,11
, but the low abundance of In (ref. 12) and
economical scale-up of epitaxially grown III–V semiconductors are
major challenges. Si is attractive for MIS photoelectrodes because
1
National Institute of Standards and Technology, Materials Measurement Laboratory, 100 Bureau Drive, Gaithersburg, Maryland 20899-1070, USA,
2
National Institute of Standards and Technology, Center for Nanoscale Science and Technology, 100 Bureau Drive, Gaithersburg, Maryland 20899-1070,
USA,
3
Sandia National Laboratories, MS9161, Livermore, California 94551-0969, USA. *e-mail: thomas.moffat@nist.gov; aatalin@sandia.gov.
it is highly abundant, its bandgap (E
g
≈ 1.12 eV) is well-suited for
absorbing sunlight, it has emerged as a low-cost material in the
photovoltaic industry, and its native oxide (SiO
2
) can serve as an
insulating layer that is thermodynamically stable over a wide range
of pH and potentials
13
. Recently, McIntyre et al. demonstrated a
Si-based MIS-type photoanode using continuous ultrathin films of
Ir and TiO
2
deposited on n-Si (ref. 6). This photoanode exhibited an
appreciable inferred photovoltage of ≈550 mV and good stability
under strongly oxidizing conditions. However, the conversion
efficiencies of Si-based MIS photocathodes demonstrated to date
4,5
remain well below the solar-to-electricity conversion efficiencies
of comparable Si photovoltaic cells. This disparity has been largely
attributed to unfavorable energy band alignment in p-Si based MIS
junctions and high recombination rates at the SiO
2
/Si interface
4,10
.
Herein, we demonstrate two modifications to the basic MIS
structure that significantly improve the conversion efficiency of
Si-based MIS photocathodes. Specifically, we introduce the use of
bilayer metal collectors and a high-quality tunnelling oxide layer
grown by thermal annealing. Furthermore, we present evidence that
hydrogen evolution rates on these MIS photocathodes are enhanced
by hydrogen spillover-assisted H
2
evolution and long-distance
transport of photogenerated minority carriers through inversion
channels; findings with important implications for future MIS
photoelectrode development.
Si-based MIS photoelectrodes were fabricated using p-Si(100)
wafers, on which 2 nm thick SiO
2
tunnelling layers were grown
by rapid thermal oxidation (RTO) at 950
◦
C. Previous studies
have shown that similar RTO treatments can produce high-quality
SiO
2
/Si interfaces with low interfacial defect densities, comparable
to thermal oxidation
14
. In addition to samples with RTO-grown
SiO
2
, cleaned wafers were exposed to the ambient, resulting in
growth of a ≈1.4 nm native SiO
2
layer on the Si surface. Bilayer
metal collectors of various diameters, thicknesses, and inter-
collector spacing were deposited onto the oxide-covered p-Si(100)
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