saqarTvelos mecnierebaTa erovnuli akademiis moambe , t. 2, #4, 2008 BULLETIN OF THE GEORGIAN NATIONAL ACADEMY OF SCIENCES, vol. 2, no. 4, 2008 © 2008 Bull. Georg. Natl. Acad. Sci. Physical Chemistry Competitive Methods of Nano and Micro Coatings and Clusters Deposition for Electronics and Conversion of Solar Energy Teimuraz Khoperia*, Tinatin Zedginidze*, Grigor Mamniashvili*, Anatoly Akhalkatsi** * E. Andronikashvili Institute of Physics, Tbilisi ** I. Javakhishvili Tbilisi State University (Presented by Academy Member K. Japaridze) ABSTRACT. New data are presented on the competitive nanotechnologies for fabrication of fine-grained powder-like particles, films, bulk materials, nanocomposites, devices for microelectronics, nanoelectronics, photonics and photocatalysis. The proposed nanotechnologies for electronics are much more advantageous and simpler than other expensive and complicated methods such as e-beam lithography, X-ray lithography or production of devices using light phase shift photomasks. The mechanism of sensitization and activation was established. The proposed methods of metallization are widely used in electronics and instrument-making. As a result, Au, Ag and Pd were adequately replaced with alloys of non-precious metals, the use of toxic substances was eliminated and the technology was significantly simplified. The first results are presented on the applica- tion of a new improved resolution NMR method using an additional dc pulse magnetic field to study cobalt- based materials synthesized by the proposed methods. © 2008 Bull. Georg. Natl. Acad. Sci. Key words: nanotechnology, nanoelectronics, piezoengineering, photocatalysis. 1. Results and Discussion 1.1. The Mechanism of Reactions of Electroless Nickel Deposition It is shown that electroless deposition of Ni-P and Ni-B alloys can be successfully used in piezoengineering, microelectronics, and so on [1-20]. For development of the optimum technology, we improved the entire cycle of the metallization process: preliminary treatment of various substrates (sensitization and activation), com- position of solutions and the parameters of electroless deposition, parameters of heat treatment after deposi- tion, conditions of photolithography, selective etching processes, etc. [1-4, 18-20]. At adding HCl (1 milliliter of concentrated acid per gram of PdCl 2 .2H 2 O), chloropalladic acid is formed ac- cording to the reaction: 2 HCl + PdCl 2 = H 2 PdCl 4 , (1) which affects favorably the activation process. It was established that a part of the palladium ions, not reduced by sensitization-activation: Sn (II) + Pd (II) = Sn (IV) + Pd, (2) can be partially reduced at subsequent interaction with hypophosphite in the solution of electroless deposition according to the reaction: PdCl 4 2– + H 2 PO 2 – + H 2 O = Pd +H 2 PO 3 – + 2H + + 4Cl – . (3) The results of investigation showed for the first time