Spectroscopic Ellipsometry and White-Light Interferometry Investigation into
Time-Dependent Oxidation Rates of Uranium in Pure Oxygen
Yaakov Idell
1*
, Wigbert Siekhaus
1
and William McLean II
1
1.
Lawrence Livermore National Laboratory, Materials Science Division, Livermore, CA, USA.
* Corresponding author: idell1@llnl.gov
Material degradation of uranium resulting from the uranium-oxygen reaction has long been of great
interest to the nuclear industry in hopes of solving long-term storage and disposal related concerns.
Uranium reacts with oxygen as follows: +ቀ
ଶା௫
ଶ
ቁ
ଶ
→
ଶା௫
. At temperatures up to 200 °C, the oxide
formed is a hyperstoichiometric uranium dioxide (UO2), with x in the range of 0.2 to 0.4 [1]; while at
higher temperatures (>275 °C), U3O8 is formed in addition to the UO2. Initially, there is a thin protective
oxide film present (<1 µm). The rate of oxidation for a thin oxide film follows a parabolic time-dependent
growth rate that exhibits a growth rate behavior that is inversely proportional to the oxide thickness and
is controlled by the diffusion of oxygen ions through the oxide [2]. During this period of oxide growth,
elastic strain is gradually formed due to the oxide-metal density mismatch. At a certain oxide layer
thickness, the strain reaches a critical level, and the oxide layer begins to crack. Upon the onset of cracking,
the oxide growth is accelerated towards a linear or para-linear time dependence, which has been reported
to occur at approximately 1 µm [3]. The oxidation kinetics for thick oxide films (>1 µm) is determined by
both oxygen diffusion through a thin adherent oxide layer and the reaction of the outer surface of this
oxide, which forms a porous unprotective outer layer [4]. It is not well understood precisely when this
transition from a thin oxide to thick oxide occurs. Additionally, most of the previous studies regarding
oxide growth in a uranium-oxygen system has been conducted with dry air [5]. Previous researchers have
proposed because nitrogen does not react with uranium at low temperatures (<300°C); therefore, the
uranium-dry air reaction is essentially the same as the uranium-oxygen reaction.
We investigated the oxide layer kinetics through in-situ spectroscopic ellipsometry (SE) and white-light
interferometry (WLI) to determine the thickness at which the time-dependent growth rates transition from
parabolic to linear. Additionally, we report and discuss differences in the oxidation kinetics of uranium in
a pure oxygen environment against the literature of dry air. The sample was inserted into an environmental
cell that was capable of being heated up to 300 °C while flowing 99.95 % oxygen gas. Several experiments
were conducted at different temperatures ranging from 60 °C to 185 °C in order to capture the transition
thickness of the time-dependent growth rates from parabolic to linear. Prior to running in-situ SE
measurements, it was necessary to experimentally determine the optical constants for uranium and UO2,
which were determined to have excellent agreement with previously published values [6]. Figure 1 shows
our experimentally determined oxidation growth rates where we observed only a parabolic growth rate.
The activation energy of UO2 in pure O2 was determined to be 51.19 ± 4.25
with a rate equation of
ln = 9.637 −
ଵହ
. The associated oxide growth function in pure O2 was determined to be =
10.185 +
ఱభభఴళ.మ
ఴ.యభర
ቀ
భ
భబళశమ
భ
శమళయ
ቁ
൫2.9229√ ൯.
The initial data suggests that the parabolic-only oxidation growth rates might be associated with the
characterization technique used. Previous studies have typically used x-ray diffraction or weight gain
measurements to describe the oxide growth mechanics. These measurements are volume fraction
1550
doi:10.1017/S1431927619008481
Microsc. Microanal. 25 (Suppl 2), 2019
© Microscopy Society of America 2019
https://doi.org/10.1017/S1431927619008481
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