Journal of Alloys and Compounds 478 (2009) 594–598
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Journal of Alloys and Compounds
journal homepage: www.elsevier.com/locate/jallcom
Synthesis of cobalt oxide interconnected flacks and nano-worms structures
using low temperature chemical bath deposition
S.G. Kandalkar
a
, J.L. Gunjakar
a
, C.D. Lokhande
b,∗
, Oh-Shim Joo
b,∗
a
Thin Film Physics Laboratory, Department of Physics, Shivaji University, Kolhapur 416 004 (M. S.), India
b
Clean Energy Research Center, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul 130-650, Republic of Korea
article info
Article history:
Received 27 September 2008
Received in revised form
18 November 2008
Accepted 21 November 2008
Available online 30 November 2008
Keywords:
Cobalt oxide
Thin films
Chemical deposition
Nanostructure
abstract
Interconnected flacks and nano-worms structures of cobalt oxide on glass and copper substrates
have been deposited using chemical bath deposition method from aqueous alkaline cobalt chloride
(CoCl
2
·6H
2
O) solution. The cobalt oxide films were examined with X-ray diffraction (XRD), scanning
electron microscopy (SEM), transmission electron microscopy (TEM), optical absorption and electrical
resistivity techniques. The structural analyses showed that as-deposited amorphous CoO(OH) films con-
verted into crystalline Spinel Co
3
O
4
after annealing. Nanocrystalline grains with some overgrown clusters
of cobalt oxide were revealed from surface morphological studies. TEM study showed the formation of
nanocrystals with a diameter ranging from 5 to 10nm. From optical studies, band gap of 2.4eV was esti-
mated for cobalt oxide thin film. The electrical resistivity exhibited semiconducting behavior of cobalt
oxide thin film.
© 2008 Elsevier B.V. All rights reserved.
1. Introduction
Oxide thin films are one of the most attracting areas of mate-
rial research due to their fascinating domestic as well as industrial
applications. Nanostructured oxides with different morphologies
such as nanotubes, nanowires, nanorods, nanobelts, etc. have drawn
considerable attention over the past few years due to their large
surface area activated applications [1]. Cobalt oxide is a p-type
antiferromagnetic oxide semiconductor with the highest Curie
temperature, T
c
= 1396 K. Cobalt oxide thin films on conducting sub-
strates are significant candidate for electrochemical capacitor [2–6].
Cobalt oxide occurs in two different modifications namely as CoO
and Co
3
O
4
. The excess of oxygen in cobalt oxide yields a p-type
semiconducting behaviour [7,8].
Various physical as well as chemical deposition techniques
have been adopted for the deposition of cobalt oxide thin films
[9–13]. However, physical deposition techniques suffer the dis-
advantages like small area of deposition, extreme cleaning after
each deposition, requirement of high deposition temperature, high
working cost, etc. Owing to the disadvantages of the physical
deposition techniques, the soft solution deposition techniques
like chemical deposition (CBD), electrodeposition (ED), Successive
ionic layer adsorption and reaction (SILAR), spray pyrolysis (SP),
∗
Corresponding authors. Tel.: +91 231 2609229; fax: +91 231 2600233.
E-mail addresses: l chandrakant@yahoo.com (C.D. Lokhande),
joocat@kist.re.kr (O.-S. Joo).
etc. have received progressively growing attention in the recent
years [14–17]. Soft solution chemical techniques allow bottom-up
approach to tune morphology of nanocrystalline materials in thin
film form with better control of particle size, shape, size distribu-
tion, particle composition, degree of particle agglomeration, etc.
Chemical bath deposition is one such technique, in which depo-
sition of metal chalcogenide occurs due to substrates maintained in
contact with dilute chemical bath containing a metal and chalco-
gen ions. The film formation takes place when ionic product exceeds
solubility product. CBD is simple, low cost and applicable for large-
scale production [15].
In the present work, cobalt oxide thin films have been deposited
using CBD from aqueous alkaline medium. The effect of different
substrates on the surface morphology and structural properties has
been investigated. The cobalt oxide thin films are annealed in air at
623 K to study the annealing effect on the structural, optical and
electrical properties.
2. Experimental
Deposition of cobalt oxide thin film was carried out onto previously cleaned glass
and copper substrates. Before deposition, glass microslides were boiled in chromic
acid for 30 min, washed with detergent, rinsed in acetone, and finally ultrasonically
cleaned with double distilled water [18]. Similarly, copper substrates were mirror
polished using zero grade polish paper and ultrasonically cleaned with double dis-
tilled water. Preparation of cobalt oxide thin film by CBD method is based on the
heating of alkaline bath of cobalt salt containing the substrates immersed in it. The
0.1 M cobalt (II) chloride (CoCl2·6H2O) was used as source of Co
2+
and to make it
alkaline, 25% aqueous ammonia solution was added with constant stirring. Initially,
solution becomes turbid due to precipitate formation of Co(OH)2. Further addition
of excess ammonia dissolves precipitate of Co(OH)2 and makes clear and transparent
0925-8388/$ – see front matter © 2008 Elsevier B.V. All rights reserved.
doi:10.1016/j.jallcom.2008.11.095