A Novel Approach To Produce Biologically Relevant
Chemical Patterns at the Nanometer Scale: Selective
Molecular Assembly Patterning Combined with Colloidal
Lithography
Roger Michel,
†
Ilya Reviakine,
†,‡
Duncan Sutherland,
§
Christian Fokas,
|
Gabor Csucs,
⊥
Gaudenz Danuser,
⊥
Nicholas D. Spencer,
†
and Marcus Textor*
,†
Laboratory for Surface Science and Technology, Department of Materials,
ETH Zurich, Schlieren, Switzerland, Department of Applied Physics, Chalmers University of
Technology, Go ¨ teborg, Sweden, Laboratory for Organic Chemistry, Department of Chemistry,
ETH Zurich, Schlieren, Switzerland, and BioMicroMetricsGroup, Department for Mechanical
and Process Engineering, ETH Zurich, Schlieren, Switzerland
Received April 10, 2002. In Final Form: August 6, 2002
A novel patterning technique that combines colloidal patterning with selective adsorption of organic
molecules has been used to chemically pattern metal oxide surfaces at length scales down to 50 nm.
Lithographic nanofabrication using surface-assembled colloids as etch masks (“colloidal lithography”) was
used to create nanopillars of TiO2 (50-90 nm in diameter, ∼20 nm in height) on whole oxidized silicon
or quartz wafer substrates. These nanopillars were then rendered hydrophobic by the selective self-
assembly of an organophosphate, whereas a poly(ethylene glycol)-grafted copolymer was adsorbed onto
the surrounding SiO
2 rendering it protein resistant. This resulted in a two-component chemical pattern,
displaying contrast with respect to protein adsorption (protein-adhesive pillars on nonadsorbing background).
This property allows for efficient translation of the lithographic pattern into a surface protein pattern by
two simple dip-and-rinse processes in aqueous solutions. The feasibility of the method and its quality were
tested by adsorbing fluorescently labeled streptavidin and biotinylated phospholipid vesicles. The sequential
adsorption steps were monitored by fluorescence microscopy, atomic force microscopy, and scanning near-
field optical microscopy. These techniques conclusively demonstrated the utility of the described approach
for chemical patterning surfaces on the nanometer scale over large areas.
1. Introduction
The biomaterials used today for the fabrication of
biomedical devices such as implants are usually not
engineered to induce specific biological responses. In
particular, the biochemical processes taking place at the
interface between the artificial material surface and the
bioenvironment are rarely addressed in the surface design.
As a consequence, a large variety of proteins and other
extracellular matrix components can adsorb to the bio-
material surface in different conformations and orienta-
tions. It has been hypothesized that such undefined
biofilms are uncommon to nature’s biological recognition
and immune system, with the effect that the body reacts
toward the synthetic material as toward a foreign body.
1
A frequent response of the body to biomaterials is
encapsulation and isolation of the implanted device from
the blood stream, causing a cascade of reactions that may
adversely affect the healing process and the functionality
of the device. It is well-known that morphological and
topographical features of the biomaterial surface influence
the interaction between implant and tissue, most likely
through their effect on the proteinacious surface film.
2-6
Improved control over the functional organization of the
adsorbed protein layers is therefore one possible approach
to improve the ability of the implant to integrate in the
host tissue without encapsulation. A key feature of such
a strategy would be the elimination or reduction of
nonspecific adsorption while at the same time providing
chemically and structurally designed interactive sites for
the attachment of desirable proteins (such as cell-adhesive
proteins) in active conformations. Ultimately, this would
imply complete control over the material surface properties
on the scale of individual protein molecules.
While a variety of standard techniques is available for
engineering of surfaces on the micrometer scale, important
advances in nanofabrication technology have only recently
opened up new technical solutions to surface engineering
on the sub-micrometer scale. Electron-beam lithography,
for example, has been successfully used to manufacture
nanometer structures with applications ranging from
model catalysts
7
to optically active substrates for surface-
enhanced Raman spectroscopy (SERS).
8
Such sequential
* To whom correspondence may be addressed at: ETH Zurich,
Oberfla ¨ chentechnik, Wagistrasse 2, CH-8952 Schlieren, Switzer-
land. E-mail: textor@surface.mat.ethz.ch. Fax: ++41 1 633 10 48.
†
Laboratory for Surface Science and Technology, Department
of Materials, ETH Zurich.
‡
Current address: Department of Chemical Engineering, Uni-
versity of Houston, Houston, TX.
§
Department of Applied Physics, Chalmers University of
Technology.
|
Laboratory for Organic Chemistry, Department of Chemistry,
ETH Zurich.
⊥
BioMicroMetricsGroup, Department for Mechanical and Pro-
cess Engineering, ETH Zurich.
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8580 Langmuir 2002, 18, 8580-8586
10.1021/la0258244 CCC: $22.00 © 2002 American Chemical Society
Published on Web 10/05/2002