Polyelectrolyte Trilayer Combinations Using
Spin-Assembly and Ionic Self-Assembly
Malkiat S. Johal,
†
Joanna L. Casson,
‡
Peter A. Chiarelli,
§,⊥
Ding-Guo Liu,
⊥
Jennifer A. Shaw,
†
Jeanne M. Robinson,
‡
and Hsing-Lin Wang*
,⊥
Division of Natural Sciences, New College of Florida, Sarasota, Florida 34243, Chemistry
Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, Department of
Chemistry, Pomona College, Claremont, California 91711, and Biosciences Division,
Los Alamos National Laboratory, Los Alamos, New Mexico 87545
Received May 8, 2003. In Final Form: July 17, 2003
Water-soluble, cationic, anionic, and neutral polymers are used to form various repeat trilayer films via
ionic self-assembly (ISA) and spin-assembly. These multilayer thin films assemble through physical
entanglement, electrostatic, and/or H-bonding interactions. Spin assembly has the advantage over ISA
in constructing stable multilayers when polyelectrolytes with like charge are assembled in adjacent layers.
These multilayers do not desorb in water over a long period of time. In contrast to spin assembly, the ISA
method deposits only a minimal amount of polyelectrolyte on top of a like-charged layer. The mechanical
entanglement that is responsible for the deposition of like-charged species in spin assembly is probably
lacking in ISA. The ability to construct repeated trilayers or multilayers composed of polycations, polyanions,
and neutral polymers allows the fabrication of multilayer thin films with the desired interfacial structure
and interactions. In this work, polyelectrolytes with NLO chromophores are used because the deposition
can be easily monitored through UV-visible spectroscopy and they have potential utility for NLO thin
film devices. The adsorption kinetics of an ISA trilayer was studied, and it was found that the adsorption
reaches equilibrium in 15 s to 5 min, depending on the structure and specific interaction between layers.
Introduction
Multilayered films constructed from polyelectrolyte
layers in a scheme of alternating charge have received
much attention in recent years. The molecular scale order
induced during the assembly of the polyelectrolyte films
is important to applications in a growing number of
areas, including nonlinear optics,
1,2
photonics,
3,4,5
drug
delivery,
6-10
and biosensing.
11
These ordered films have
been built by using vapor deposition,
12,13
Langmuir-
Blodgett deposition,
14,15
and drop-casting.
16
However, each
of these methods limits either the dimensions of the films
or the materials available for use in the films. Two other
methods with fewer restrictions on the deposition of
charged polymers are ionic self-assembly
17-20
(ISA) and
spin assembly.
21-23
The ISA method has been practiced
extensively over the past decade, while polyelectrolyte
spin assembly is a relatively new technique.
Spin assembly was developed recently to construct thin
films of alternating charge composition. As small amounts
of dilute polyelectrolyte solution are dropped onto a
spinning substrate, layers of repeatable thickness deposit
on the surface. In addition to electrostatic forces, spin
assembly induces deposition through polymer chain
entanglement between the deposited layer and the film’s
outer layer.
21,24
The amount of material deposited in spin
assembly can be modulated through the adjustment of
spin speed or solution concentration.
21,25
Recently, we have
found that multiple deposition cycles of a single poly-
electrolyte can result in the formation of a film whose
thickness grows linearly with each deposition.
21
Such films
* To whom correspondence should be addressed.
†
New College of Florida.
‡
Chemistry Division, Los Alamos National Laboratory.
§
Pomona College.
⊥
Biosciences Division, Los Alamos National Laboratory.
(1) Casson, J. L.; McBranch, D. W.; Robinson, J. M.; Wang, H. L.;
Roberts, J. B.; Chiarelli, P. A.; Johal, M. S. J. Phys. Chem. B 2000, 104,
11996.
(2) Heflin, J. R.; Liu, Y.; Figura, C.; Marciu, D.; Claus, R. O. Proc.
SPIE 1997, 3147, 10.
(3) Kajzar, F.; Swalen, J. D., Eds. Organic Thin Films for Waveguiding
Nonlinear Optics; Gordon and Breach Publishers: Amsterdam, 1996.
(4) Li, D. Q.; Ramos, Jr., O. In Photonic Polymer Systems; Wise, D.
L., Wnek, G. E., Tantolo, D. J., Cooper. T. M., Gresser, J. D., Eds.;
Marcel Dekker: New York, 1998.
(5) Wang, H. L.; McBranch, D. W.; Klimov, V. I.; Helgeson, F. W.
Chem. Phys. Lett. 1999, 315, 173.
(6) Chung, A. J.; Rubner, M. F. Langmuir 2002, 18, 1176.
(7) Qiu, X.; Leporatti, S.; Donath, E.; Mohwald, H. Langmuir 2001,
17, 5375.
(8) Shi, X.; Caruso, F. Langmuir 2001, 17, 2036.
(9) Yang, W.; Trau, D.; Renneberg, R.; Teng, N.; Caruso, F. J. Colloid
Interface Sci. 2001, 234, 356.
(10) Antipov, A. A.; Sukhorukov, G. B.; Donath, E.; Mo ¨hwald, H. J.
Phys. Chem. B 2001, 105, 2281.
(11) Gavalas, V. G.; Chaniotakis, N. A. Mikrochim. Acta 2001, 136,
211.
(12) Usui, H. Thin Solid Films 2000, 365, 22.
(13) Tamada, M.; Koshidawa, H.; Suwa, T.; Yoshioka, T.; Usui, H.;
Sato, H. Polymer 2000, 41, 5661.
(14) Johal, M. S.; Parikh, A. N.; Lee, Y.; Casson, J. L.; Foster, L.;
Swanson, B. I.; McBranch, D. W.; Li, D. W.; Robinson, J. M. Langmuir
1999, 15, 1275.
(15) Ulman, A. An Introduction to Ultrathin Organic Films from
Langmuir-Blodgett to Self-Assembly; Academic Press: San Diego, CA,
1991.
(16) Johal, M. S.; Cao, Y. W.; Chai, X. D.; Smilowitz, L. B.; Robinson,
J. M.; Li, T. J.; McBranch, D.; Li, D. Q. Chem. Mater. 1999, 11, 1962.
(17) Decher, G.; Hong, J. D.; Schmit, J. Thin Solid Films 1992, 210/
211, 831.
(18) Shiratori, S. S.; Rubner, M. F. Macromolecules 2000, 33, 4213.
(19) Mendelsohn, J. D.; Barrett, C. J.; Chan, V. V.; Pal, A. J.; Mayes,
A. M.; Rubner, M. F. Langmuir 2000, 16, 5017.
(20) Lvov, Y.; Yamada, S.; Kunitake, T. Thin Solid Films 1997, 300,
107.
(21) Chiarelli, P. A.; Johal, M. S.; Casson, J. L.; Roberts, J. B.;
Robinson, J. M.; Wang, H. L. Adv. Mater. 2001, 13, 1167.
(22) Chiarelli, P. A.; Johal, M. S.; Holmes, D. J.; Casson, J. L.;
Robinson, J. M.; Wang, H. L. Langmuir 2001, 18, 168.
(23) Cho, J.; Char, K.; Hong, J. D.; Lee, K. B. Adv. Mater. 2001, 13,
1076.
(24) Weill, A.; Dechenaux, E. Polym. Eng. Sci. 1988, 28, 945.
(25) Lee, S. S.; Hong, J. D.; Kim, C. H.; Kim, K.; Koo, J. P.; Lee, K.
B. Macromolecules 2001, 34, 5358.
8876 Langmuir 2003, 19, 8876-8881
10.1021/la034788l CCC: $25.00 © 2003 American Chemical Society
Published on Web 09/12/2003