Journal of Alloys and Compounds 518 (2012) 96–100
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Journal of Alloys and Compounds
j our na l ho me p ag e: www.elsevier.com/locate/jallcom
Ellipsometric studies of optical properties of copper doped zinc oxide films on
glass substrates
A. Kostruba
a,c,∗
, B. Kulyk
b
, B. Turko
b
a
Lviv Institute for Physical Optics, Dragomanova Street, 23, UA-79005, Ukraine
b
Scientific-Technical and Educational Center of Low Temperature Studies, Physics Department, Ivan Franko National University of Lviv, Dragomanova Street, 50, UA-79005, Lviv,
Ukraine
c
Lviv Academy of Commerce, Samtshuka Street, 9, UA-79005, Lviv, Ukraine
a r t i c l e i n f o
Article history:
Received 7 November 2011
Received in revised form
24 December 2011
Accepted 27 December 2011
Available online 3 January 2012
Keywords:
Copper-doped ZnO film
RF-magnetron sputtering
Ellipsometry
Optical properties
AFM
a b s t r a c t
Copper-doped ZnO films with thickness about 1200 nm were prepared by radio-frequency (RF)-
magnetron sputtering on glass substrates. The influence of dopant on the optical properties was
investigated using ellipsometry technique. It has been found that only three layer model of surface can
be satisfactory fitted with experimental data of ellipsometric measurements obtained in wide range of
incident angles. Presence of additional layers within the model can be explained by the interface rough-
ness. The atomic force microscopy (AFM) analysis indicates that thickness of additional layers and value
of interface roughness are commensurable. The optical parameters of copper-doped ZnO structures with
different concentration of copper dopant were obtained using the fitting procedure within the three-layer
model. Absence of copper clusters in the ZnO:Cu layer microstructure was confirmed using X-ray diffrac-
tion and the effective media approximation (EMA) analysis. Refractive indices of doped ZnO:Cu layers
(n = 2.002. . .2.04) are very close to the index of ZnO film (n = 1.98) at 632.8 nm. Extinction coefficient
increase gradually to (k = 0.002) with the dopant concentration increasing.
© 2012 Elsevier B.V. All rights reserved.
1. Introduction
Zinc oxide (ZnO) is a wide-band-gap semiconductor and is also
a piezoelectric material which has a reasonably large piezoelec-
tric coefficient. Such unique property has been widely studied for
its practical applications [1]. A rich family of ZnO nanostructures
provides numerous opportunities for researchers to explore their
properties and find potential applications.
For semiconductors, doping is a powerful tool to tailor the elec-
trical and optical properties, facilitating the construction of many
electronic and optoelectronic devices. Cu doping modifies the pho-
toluminescent transitions in ZnO by creating localized impurity
levels [2,3]. Additionally, Cu behaves as an acceptor in ZnO with
its energy level locating at 0.17 eV below the bottom of the con-
duction band, making itself a good candidate for creating p-type
ZnO [4]. More interestingly, previous studies, both theoretical and
experimental, showed that ZnO doped with appropriate transition
metals are diluted magnetic semiconductors [5] which attracted
a lot of interest due to their potential applications in spintronics.
Coexistence of the ZnO and Au nanoparticles gives a substantially
∗
Corresponding author at: Lviv Academy of Commerce, Samtshuka Street, 9, UA-
79005, Lviv, Ukraine. Tel.: +380 676038722.
E-mail address: andriykostruba@yahoo.com (A. Kostruba).
enhancement of photoinduced second harmonic generation [6]
that can be explained by the contribution of the electron–phonon
interactions [7].
Therefore, optical properties of ZnO thin film tailored by Cu dop-
ing can be informative to predict the structural, electrical and other
characteristics of material.
Ellipsometry is a powerful and attractive technique that recently
has found much favor in the non-destructive and in situ charac-
terization of solids, thin surface films, structure of interfaces at
nanometer scale [8]. Structural changes and optical constants mod-
ification of solid induced by doping procedure can be estimated
using ellipsometric method too [9].
2. Materials and experiment
Optical characteristics of ZnO:Cu thin films with different atomic amount of Cu
dopant were explored using multiple angle of incidence (MAI) ellipsometry at single
wavelength ( = 632.8 nm). The ZnO:Cu thin films were deposited on glass substrates
by means of radio-frequency magnetron sputtering system using ZnO-powder tar-
gets together with oxide CuO in argon-oxygen atmosphere at the gas pressure of
10
-3
Torr. In order to minimize the thermal stresses the substrate temperature was
fixed at 300
◦
C. The target-to-substrate distance was 60 mm and RF-power – 100 W.
The atomic amount of Cu dopant in the film material (taken from energy dis-
persive X-ray (EDX) analysis using a REMMA-102-02 scanning electron microscope,
working at 20 kV dc acceleration voltages in vacuum) changed from 0.5% to 5%. The
thickness of ZnO:Cu thin films was estimated by the deposition time and was about
1200 nm for all the specimens.
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doi:10.1016/j.jallcom.2011.12.141