Thermochimica Acta 494 (2009) 45–53
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Thermochimica Acta
journal homepage: www.elsevier.com/locate/tca
Thermolysis of new hybrid silsesquioxane–carbosilane materials
Anna Kowalewska
a,∗
, Witold Fortuniak
a
, Krystyna Rózga-Wijas
a
, Bartosz Handke
b
a
Centre of Molecular and Macromolecular Studies, Polish Academy of Sciences, Sienkiewicza 112, 90-363 Lód´ z, Poland
b
AGH University of Science and Technology, Faculty of Materials Science and Ceramics, Al. Mickiewicza 30, 30-059 Kraków, Poland
article info
Article history:
Received 15 January 2009
Received in revised form 17 April 2009
Accepted 21 April 2009
Available online 3 May 2009
Keywords:
Thermolysis
Silsesquioxane
Carbosilane
Tris(trimethylsilyl)methane
abstract
Thermal decomposition of new silsesquioxane materials [(Me
3
Si)
3
CSiMe
2
CH
2
CH
2
SiO
3/2
]
n
(PT
Si
SS), substi-
tuted with sterically hindered carbosilane groups, was studied in an inert atmosphere (N
2
) and air. It was
found that a specific degradation of carbosilane moieties occurs at high temperatures. A ceramic residue
was obtained > 900 K both in nitrogen (Si
x
O
y
C
z
) and air (Si
x
O
y
). Thermal rearrangements in the structure of
polyhedral and ladder-like PT
Si
SS were studied, and related to those observed for a polymethylsilsesquiox-
ane resin (PMSS) of regular ladder-like architecture. Thermally induced transformations were evaluated
by TGA(DTA)-MS, FTIR, NMR, XRD and SEM.
© 2009 Elsevier B.V. All rights reserved.
1. Introduction
Polyhedral silsesquioxane units introduced into polymeric
nanocomposite materials can improve their thermal, mechani-
cal and dielectric properties [1–10]. The investigation of their
decomposition at high temperatures can provide an insight into
the system stability and explain the mechanism of conversion
into a ceramic material [11]. Thermolysis of various octahedral
[12–17] and polymeric [18–30] silsesquioxanes has been thus stud-
ied. Completely condensed octahedral POSS {T
8
R
,R c-C
6
H
11
[12],
C
n
H
2n+1
(n = 2–10) [13], Me, Vi, i-Bu, i-Oct [14], CH
2
CH
2
OCH
2
CH
2
Cl
[15], OSiMe
2
H [16], OSiMe
2
CH
2
CH
2
Ph [17]} were found to sub-
lime on heating in an inert atmosphere. It was shown that on
increasing the length of alkyl chain from C
2
to C
10
in octahedral
POSS the weight loss onset (due to volatilisation and decom-
position) shifted to higher temperatures [13]. Octahedral POSS
with simple organic substituents that do not sublime at ele-
vated temperatures in N
2
can be found among these tending
to form chars of aromatic structure on decomposition. T
8
Ph is
thermally stable up to 620 K in N
2
and leaves 70% of ceramic
residue > 1000 K [14]. Acetoxyphenyl and hydroxyphenyl substi-
tuted POSS, capable of hydrogen bonding, gave respectively 60%
and 70% char yields at 1100K [17]. Very recently we have reported
preparation of a new type of hybrid silsesquioxane materials
– [(Me
3
Si)
3
CSiMe
2
CH
2
CH
2
SiO
3/2
]
n
(PT
Si
SS) – bearing a sterically
hindered tris(trimethylsilyl)methyl (T
Si
)-type ligands [31] .They
∗
Corresponding author. Tel.: +48 4268 03203; fax: +48 4268 47126.
E-mail address: anko@cbmm.lodz.pl (A. Kowalewska).
are built of octahedral or ladder-like silsesquioxane framework
surrounded by nonpolar carbosilane ligands. Contrary to com-
mon octahedral T
8
molecules, [(Me
3
Si)
3
CSiMe
2
CH
2
CH
2
SiO
3/2
]
8
(PT
Si
SS-I, Scheme 1) do not sublime on heating in nitrogen atmo-
sphere. Comparative thermogravimetric analysis [32] of octahedral
silsesquioxanes functionalized with typical organic groups (Me,
Vi, Ph) and PT
Si
SS-I points out to the unique properties of the
latter. Bulky T
Si
groups were already shown to provide an excep-
tional steric protection to polymeric systems, resulting in an
effective separation of polymeric chains and a substantial decrease
in their mobility [33–38]. Consequently, an improved material
performance, glass transition temperature increase and ther-
mal resistance enhancement are observed. Octahedral, crystalline
(PT
Si
SS-I) and ladder-like, polymeric (PT
Si
SS-II) silsesquioxanes
bearing T
Si
groups were thus examined for the structural changes
occurring during their thermolysis.
It is known that the steric strain within T
Si
ligand is decreased
by a specific arrangement of Me
3
Si-substituents about the cen-
tral carbon atom [39–41]. Due to the significant difference in the
length of Si C bonds within T
Si
moiety (inner Si C
q
and outer
Si CH
3
), breaking of the former was found to be more feasible
during UV-laser induced decomposition of siloxanes with side
tris(trimethylsilyl)hexyl groups [35]. The difference in the bond
length between inner Si C
q
and outer Si CH
3
in T
Si
moiety is
also the cause of a particular thermal transition and heat capac-
ity change in PT
Si
SS. Combined DSC and variable temperature NMR
(
29
Si and
13
C) methods indicated an increase in mobility of Me
3
Si
groups above this temperature [31]. The finding was thought to be
of importance for the mechanism of thermolysis of PT
Si
SS. Accord-
ingly, it was expected that C SiMe
3
bonds would break easily at
0040-6031/$ – see front matter © 2009 Elsevier B.V. All rights reserved.
doi:10.1016/j.tca.2009.04.016